2013
DOI: 10.1002/adma.201300586
|View full text |Cite
|
Sign up to set email alerts
|

Ambient Fabrication of Large‐Area Graphene Films via a Synchronous Reduction and Assembly Strategy

Abstract: A synchronous reduction and assembly strategy is designed to fabricate large-area graphene films and patterns with tunable transmittance and conductivity. Through an oxidation-reduction reaction between the metal substrate and graphene oxide, graphene oxide is reduced to chemically converted graphene and is organized into highly ordered films in situ. This work will form the precedent for industrial-scale production of graphene materials for future applications in electronics and optoelectronics.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
150
0

Year Published

2014
2014
2020
2020

Publication Types

Select...
5
3
2

Relationship

0
10

Authors

Journals

citations
Cited by 194 publications
(150 citation statements)
references
References 44 publications
0
150
0
Order By: Relevance
“…Scotch tape peeling, 1 exfoliation of graphite in various solvents (or liquid phase exfoliation) 15,16 and the arc discharge technique 17 include the most practiced top down approach techniques. Whereas the epitaxial growth techniques, 18,19 thermal annealing of silicon carbide, 20 self-assembly on metallic substrate 21 solvothermal reaction, 22 gas-phase microwave-production 23 and chemical vapor deposition (CVD) on di®erent substrates [24][25][26][27] are usually adopted for bottom up fabrication of GNSs coating. A signi¯cant amount of research has been carried out by Banks et al 14,[27][28][29][30][31][32] towards CVD synthesis of graphene sheets and its applications in various functional performance based sectors.…”
Section: Introductionmentioning
confidence: 99%
“…Scotch tape peeling, 1 exfoliation of graphite in various solvents (or liquid phase exfoliation) 15,16 and the arc discharge technique 17 include the most practiced top down approach techniques. Whereas the epitaxial growth techniques, 18,19 thermal annealing of silicon carbide, 20 self-assembly on metallic substrate 21 solvothermal reaction, 22 gas-phase microwave-production 23 and chemical vapor deposition (CVD) on di®erent substrates [24][25][26][27] are usually adopted for bottom up fabrication of GNSs coating. A signi¯cant amount of research has been carried out by Banks et al 14,[27][28][29][30][31][32] towards CVD synthesis of graphene sheets and its applications in various functional performance based sectors.…”
Section: Introductionmentioning
confidence: 99%
“…For instance, Cao et al constructed graphene films with high conductivity and mechanical stability via reduction-oxidation reactions between GO and active-metal substrates [53]. Honeycomb-structured graphene films were prepared by the template method [54,55].…”
Section: Other Methodsmentioning
confidence: 99%
“…GO reduction experiments using metal foils as a substrate were done by Cao et al [64]. A number of metal foils (Cu, Ni, Co, Fe, and Zn) were separately immersed in a GO aqueous dispersion at pH = 6.…”
Section: Transition Metals As Reducersmentioning
confidence: 99%