AFM reconstruction of complex-shaped chiral plasmonic nanostructures

Kondratov, A. V.; Rogov, Oleg Y.; Гайнутдинов, Р. В.

doi:10.1016/j.ultramic.2017.05.013

Cited by 10 publications

(8 citation statements)

References 25 publications

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“…The height map of the top of the annealed metasurface is normalized according to the FIB 3D reconstruction data. All obtained AFM images are processed with a specific numerical routine that includes a subtraction of the tip curvature radius, noise reduction, and a two-step averaging over all unit cells and their 4-fold rotations 42 , 51 .…”

Section: Methodsmentioning

confidence: 99%

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Chiral visible light metasurface patterned in monocrystalline silicon by focused ion beam

Gorkunov

Rogov

Kondratov

et al. 2018

Sci Rep

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High refractive index makes silicon the optimal platform for dielectric metasurfaces capable of versatile control of light. Among various silicon modifications, its monocrystalline form has the weakest visible light absorption but requires a careful choice of the fabrication technique to avoid damage, contamination or amorphization. Presently prevailing chemical etching can shape thin silicon layers into two-dimensional patterns consisting of strips and posts with vertical walls and equal height. Here, the possibility to create silicon nanostructure of truly tree-dimensional shape by means of the focused ion beam lithography is explored, and a 300 nm thin film of monocrystalline epitaxial silicon on sapphire is patterned with a chiral nanoscale relief. It is demonstrated that exposing silicon to the ion beam causes a substantial drop of the visible transparency, which, however, is completely restored by annealing with oxidation of the damaged surface layer. As a result, the fabricated chiral metasurface combines high (50–80%) transmittance with the circular dichroism of up to 0.5 and the optical activity of up to 20° in the visible range. Being also remarkably durable, it possesses crystal-grade hardness, heat resistance up to 1000 °C and the inertness of glass.

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Section: Methodsmentioning

confidence: 99%

“…The material layer segmentation is performed using a gray-scale-based threshold filtering, which allows to preserve the small shape features. The obtained profiles of the interfaces between the layers are subjected to the same averaging routine 51 as the AFM data above.…”

Section: Methodsmentioning

confidence: 99%

Chiral visible light metasurface patterned in monocrystalline silicon by focused ion beam

Gorkunov

Rogov

Kondratov

et al. 2018

Sci Rep

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“…In particular, complex‐shaped metasurfaces demonstrate an outstanding degree of optical chirality, feature sophisticated spectral behaviour and exhibit the extreme values of the optical activity and circular dichroism (see Gorkunov et al ., ; Wu et al ., ). The optical properties of such nanostructures are determined by their unit cell shape, size and alignment (Rogov et al ., ; Kondratov et al ., ). Focused ion beam (FIB) technique allows precise fabrication of complex shaped silicon nanostructures, which, however, exhibit unacceptably strong light absorption diminishing their optical application potential.…”

Section: Introductionmentioning

confidence: 97%

FIB‐fabricated complex‐shaped 3D chiral photonic silicon nanostructures

Rogov

Артемов

Gorkunov

et al. 2017

Journal of Microscopy

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SummaryTechnologies capable of fabricating complex shaped silicon metasurfaces attract increasing attention. The focused ion beam fabrication technique is considered traditionally as causing thick damaged layers in silicon resulting in a significant rise of the optical absorption loss. We examine the structure of the FIB-fabricated nanostructures on the silicon-on-sapphire (SOS) platform and its optical characteristics before and after thermal oxidation. We show that being thermally oxidised the FIB-patterned silicon subwavelength nanostructure tends to regain its chiral optical features. The impact of the oxidation process on the silicon nanostructure optical behaviour is discussed.

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“…In order to obtain the true topography of the sample, several reconstruction algorithms have been reported (Reiss et al, 1990;Keller, 1991;Villarrubia, 1994Villarrubia, , 1997 and some of them have been embedded into image processing software (Kondratov et al, 2017). These algorithms need the tip shape information independently obtained from EM, or they will rely on reserve imaging (Montelius & Tegenfeldt, 1993;Atamny & Baiker, 1995;Hübner, et al, 2003) or blind reconstruction (Dongmo et al, 2000;Tranchida et al, 2006;Flater et al, 2014).…”

Section: Introductionmentioning

confidence: 99%

Atomic Force Microscopy (AFM) Analysis of an Object Larger and Sharper than the AFM Tip

et al. 2019

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Atomic force microscopy (AFM) is typically used for analysis of relatively flat surfaces with topographic features smaller than the height of the AFM tip. On flat surfaces, it is relatively easy to find the object of interest and deconvolute imaging artifacts resulting from the finite size of the AFM tip. In contrast, AFM imaging of three-dimensional objects much larger than the AFM tip height is rarely attempted although it could provide topographic information that is not readily available from two-dimensional imaging, such as scanning electron microscopy. In this paper, we report AFM measurements of a vertically-mounted razor blade, which is taller and sharper than the AFM tip. In this case, the AFM height data, except for the data collected around the cutting edge of the blade, reflect the shape of the AFM tip. The height data around the apex area are effectively the convolution of the AFM tip and the blade cutting edge. Based on computer simulations mimicking an AFM tip scanning across a round sample, a simple algorithm is proposed to deconvolute the AFM height data of an object taller and sharper than the AFM tip and estimate its effective curvature.

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AFM reconstruction of complex-shaped chiral plasmonic nanostructures

Cited by 10 publications

References 25 publications

Chiral visible light metasurface patterned in monocrystalline silicon by focused ion beam

Chiral visible light metasurface patterned in monocrystalline silicon by focused ion beam

FIB‐fabricated complex‐shaped 3D chiral photonic silicon nanostructures

Atomic Force Microscopy (AFM) Analysis of an Object Larger and Sharper than the AFM Tip

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