Advanced metal lift-offs and nanoimprint for plasmonic metal patterns

Abstract

An effective and reliable fabrication approach for silver nanostructure arrays was developed using UV nanoimprint with a lift-off resist and a Si-based etch mask for enhanced plasmonic resonance-driven device performance. Since a tapered nanopillar array is imprinted on the resist, by coating it with a Si-based etch mask layer and carrying out the etching procedure, a reverse-tapered nanohole array for metal deposition can be crated. Compared to the conventional lift-off process, a more tolerable window of lifeoff process conditions is possible, and dot patterns with high-aspect-ratio thickness profiles and no rabbit ears can be fabricated. Simulation results corresponding to dot diameters of 150, 235, and 265 nm (twice those in their period) were qualitatively in good agreement with experimental results in terms of transmittance. This suggests that the proposed technique is a fairly reliable and accessible fabrication strategy for applications.

Ultra sub-wavelength surface plasmon confinement using air-gap, sub-wavelength ring resonator arrays

“…First, a SiN x /SiO 2 /SiN x multilayer film was deposited on a quartz substrate. Afterward, a hexagonal array of polymer pillars with 200 nm diameter and 800 nm pitch was formed via nanoimprinting method 41 . Using the pillars as etch masks, SiN x disks were formed in the top SiN x layer.…”

“…The SiN x layer thickness was kept constant at 70 nm, while the SiO 2 layer thickness was varied to be between 40 nm and 75 nm. After the multilayer deposition, a 4-inch wafer sized, hexagonal array of resin pillars with 200 nm diameter and 800 nm pitch was fabricated on the multilayer film using a nanoimprinting method with a UV-curable nanoimprinting resist (mr-UVCur06, micro resist technology GmbH) 41 . The scanning electron microscope (SEM) image of the imprinted pillars array is shown in Fig.…”

Surface Nanopatterned Shape Memory Alloy (SMA)‐Based Photosensitive Artificial Muscle

“…SPR is rendered by the nanopatterned surface. [15,25] As such, we investigated the relationship between light absorptance and the nanohole geometries in both simulations and experiments.…”

Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint

“…The expensive instrument limits the transferring of the functional material, both in cost and by imposing poor conditions. Another method, which is significantly cheaper, is to apply an additional lift-off layer (LOL) to the substrate before it is coated with the imprint resist [ 20 , 21 , 22 , 23 ]. Because the developing rate of the LOL is faster than that of the imprint resists, the developing LOL can penetrate beneath the imprint resist pattern to form an undercut profile favorable to lifting off metal in a chemical solution.…”