Ultra sub-wavelength surface plasmon confinement using air-gap, sub-wavelength ring resonator arrays

Abstract

Arrays of sub-wavelength, sub-10 nm air-gap plasmonic ring resonators are fabricated using nanoimprinting. In near infra-red (NIR) range, the resonator supports a single dipole mode which is excited and identified via simple normal illumination and explored through transmission measurements. By controlling both lateral and vertical confinement via a metal edge, the mode volume is successfully reduced down to 1.3 × 10−5 λ03. The advantage of such mode confinement is demonstrated by applying the resonators biosensing. Using bovine serum albumin (BSA) molecules, a dramatic enhancement of surface sensitivity up to 69 nm/nm is achieved as the modal height approaches the thickness of the adsorbed molecule layers.

Nanostructured plasmonic chips employing nanopillar and nanoring hole arrays for enhanced sensitivity of SPR-based biosensing

“…2 that the plasmon resonance dips are deeper in diamond nanopillar and diamond nanoring hole arrays than cylindrical nanopillar and cylindrical nanoring hole arrays. Although, the diamond nanopillar arrays display a smaller shi (smaller S S ) in plasmon resonance wavelength $2.1 a $0.14 a Nanodisk array 40 $1.38 a $0.016 a Nanohole array 52 $2.5 a $0.33 a Fiber nanoprobe 53 $0.41 a $0.0028 a Gold-coated silver nanoprism 54 $6.67 a $0.046 a 3-Disk array 55 6.06 -2D plasmonic crystals 56 $1.67 a -Nanogratings 57 $0.71 a -Ring resonator arrays 58 $1.6 $0.19 Non-uniform nanogratings 43 than the cylindrical nanopillar arrays. The shi in the plasmon resonance dips depends upon the high E-eld values in the biolayer region.…”

“…As extreme UV lithography can be employed to fabricate nanostructures below 7 nm, 60,61 it can be employed to fabricate the proposed nanostructured plasmonic chips on top of the underlying gold layer on a wafer scale (6 inch, 12 inch, or 18 inch wafers). The proposed nanostructures can also be fabricated by rst depositing a gold lm on a glass substrate using sputter deposition, followed by focused ion beam (FIB) milling process 58 or helium ion milling 30,62 for patterning the top surface of the gold layer. We have to note that writing large areas using FIB milling or helium ion milling can not only be very a time consuming process but also very expensive.…”

Ultra-compact plasmonic unidirectional wavelength multiplexer/demultiplexer based on slot cavities

“…With the rapid advances in nanoscale fabrication technology and easy availability of computational tools backed by affordable computational resources, researchers have been able to propose a variety of SPP based devices using a wide range of materials. Also, a few such devices with moderately complex structures have been fabricated [5][6][7][8][9]. Among these devices, those made of metal-insulator-metal (MIM) waveguides, which consists of a dielectric core and two metallic cladding layers, has drawn special attention due to their outstanding and significantly unique advantages.…”