Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition

Mernagh, V.A.; Kelly, T.C.; Ahern, Michael; Kennedy, A.D.; Adriaansen, A.P.M.; Ramaekers, P.P.J.; McDonnell, L.; Koekoek, R.

doi:10.1016/0257-8972(91)90101-2

Cited by 23 publications

(5 citation statements)

References 9 publications

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“…The hydrogen‐free a‐Si x C 1‐x coatings prepared by laser ablation and sputtering deposition methods showed the hardness of 30 GPa and the Young's modulus of 240 GPa 61 . It has been reported that the values of elastic modulus are in the range of 196–273 GPa, according to the Si‐C bond density 62 . The effects of the annealing temperature on the mechanical properties of hydrogenated amorphous SiC films (a‐SiC:H) were then studied by Porada et al 59 In this study, the hardness and Young's modulus of 10 and 118 GPa were reported, respectively.…”

Section: Resultsmentioning

confidence: 99%

“…The results of the adhesion analysis are presented in Figure 6. Different methods have been used to determine the adhesion of the thin coating to the substrate; these include scratch and nanoindentation tests 62,63 . Indentation methods are based on energy release rate criteria and delamination, considering the coating adhesion resistance 63 .…”

Section: Resultsmentioning

confidence: 99%

“…61 It has been reported that the values of elastic modulus are in the range of 196-273 GPa, according to the Si-C bond density. 62 The effects of the annealing temperature on the mechanical properties of hydrogenated amorphous SiC films (a-SiC:H) were then studied by Porada et al 59 In this study, the hardness and Young's modulus of 10 and 118 GPa were reported, respectively. In a more recent study, the hardness of 23 GPa was recorded for pure a-SiC thin films, whereas the value of the measured elastic modulus was 290 GPa.…”

Section: Methods Of Characterizationmentioning

confidence: 92%

“…Different methods have been used to determine the adhesion of the thin coating to the substrate; these include scratch and nanoindentation tests. 62,63 Indentation methods are based on energy release rate criteria and delamination, considering the coating adhesion resistance. 63 On the other hand, the indentation method can also be used to study the adhesion of the coating, qualitatively.…”

Section: Methods Of Characterizationmentioning

confidence: 99%

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The effects of adding nano‐alumina filler on the properties of polymer‐derived SiC coating

Yousefi

Ghatee

Rezakazemi

et al. 2021

Int J Applied Ceramic Tech

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In this paper, SiC coating was prepared using the polymer‐derived ceramic method; then the effect of nano‐alumina as a filler material was studied. First of all, polycarbosilane(PCS) was dissolved in xylene; after that, different amounts of nano‐alumina particles were added to the solution. The coating was deposited on the alumina substrate using the dip‐coating method; this was followed by sintering at 1200℃. The phase content and microstructure of the samples were studied by X‐ray diffraction and scanning electron microscope methods, respectively. Nanohardness, Young's modulus, and coating adhesion were investigated by a nanoindentation method. The sheet resistance was evaluated using the four‐point probe technique; also, the wear resistance of the coating was studied by applying the pin‐on‐disk method. It was found that the addition of the nano‐alumina filler up to 20 wt% drastically improved the adhesion and wear resistance of the SiC coating.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Section: Methods Of Characterizationmentioning

confidence: 92%

Section: Methods Of Characterizationmentioning

confidence: 99%

See 2 more Smart Citations

The effects of adding nano‐alumina filler on the properties of polymer‐derived SiC coating

Yousefi

Ghatee

Rezakazemi

et al. 2021

Int J Applied Ceramic Tech

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“…Among these, zirconium nitride (ZrN) has been extensively studied owing to its excellent physicomechanical and tribological properties [ 14 , 15 ]. For instance, ZrN possesses high hardness, good electrical conductivity and low chemical reactivity [ 16 ], and has been used as wear resistant coatings on cutting tools [ 17 ], and as decorative films for scratch resistance and colouring in the jewellery industry [ 18 ]. Thin films of ZrN have also been used as diffusion barriers in integrated circuits [ 19 ].…”

Section: Introductionmentioning

confidence: 99%

Atom economy and green elimination of nitric oxide using ZrN powders

et al. 2018

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Nitric oxide (NO) may cause serious environmental problems, such as acid rain, haze weather, global warming and even death. Herein, a new low-cost, highly efficient and green method for the elimination of NO using zirconium nitride (ZrN) is reported for the first time, which does not produce any waste or any by-product. Relevant experimental parameters, such as reaction temperature and gas concentration, were investigated to explore the reaction mechanism. Interestingly, NO can be easily decomposed into nitrogen (N2) by ZrN powders at 600°C with ZrN simultaneously transformed into zirconium dioxide (ZrO2) gradually. The time for the complete conversion of NO into N2 was approximately 14 h over 0.5 g of ZrN at a NO concentration of 500 ppm. This green elimination process of NO demonstrated good atom economy and practical significance in mitigating environmental problems.

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Effect of RF power and gas flow ratio on the growth and morphology of the PECVD SiC thin film s for MEMS applications

2015

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Low temperature PECVD (Plasma Enhanced Chemical Vapour Deposition) deposited SiC thin films are promising materials for development of high temperature working MEMS (Microelectromechanical System) due to their excellent mechanical properties, non-corrosive nature and ability to withstand high temperature. However, the surface roughness of such thin films is the main obstacle to achieve thicker thin films for MEMS applications as the surface more rougher by increasing the thickness of PECVD SiC thin films. Therefore, in this present study, thicker SiC thin films were deposited by PECVD process by using the CH 4 and SiH 4 as the precursor gases in presence of Ar as the carrier gas and two process parameters i.e. RF (Radio Frequency) power with mixed frequency condition and flow ratio of silane to methane were varied by keeping the temperature and pressure constant to investigate the influence of these parameters on the growth rate, surface roughness and morphology of SiC thin films. It was observed that both the RF power (with the mixed frequency condition) and flow ratio of SiH 4 /CH 4 can control the growth rate, surface roughness and morphology of the PECVD SiC thin films. Higher the carbon content in the thin films the surface became more smoother whereas the surface became for rougher by increasing the RF power.

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Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition

Cited by 23 publications

References 9 publications

The effects of adding nano‐alumina filler on the properties of polymer‐derived SiC coating

The effects of adding nano‐alumina filler on the properties of polymer‐derived SiC coating

Atom economy and green elimination of nitric oxide using ZrN powders

Effect of RF power and gas flow ratio on the growth and morphology of the PECVD SiC thin film s for MEMS applications

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