Addition of surfactants in ozonated water cleaning for the suppression of functional group formation and particle adhesion on the SiO2 surface

Yang, Jaesung; Im, K. H.; Lim, Sangwoo

doi:10.1016/j.apsusc.2010.11.004

Cited by 11 publications

(2 citation statements)

References 10 publications

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“…As for JFC-E, the peak of the OH stretching vibration is at 3400.54 cm −1 , CH 2 antisymmetric stretching vibration is at 2927.01 cm −1 , 1109.39 cm −1 and 1020.33 cm −1 are the peaks of ether bond stretching vibration, 792.77 cm −1 is C-O-C in-plane bending vibration, and 715.32 cm −1 is CH 2 CH 2 O in-plane bending vibration. 24 In Fig. 5, the FTIR spectra of compound surfactant samples with different volume ratios of AES and JFC-E (2:1, 1:1, 2:3) shifted from single surfactant of AES and JFC-E.…”

Section: Resultsmentioning

confidence: 98%

Effect of Intermolecular Interaction of Compound Surfactant on Particle Removal in Post-Cu CMP Cleaning

Gao

Wang

et al. 2021

ECS J. Solid State Sci. Technol.

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This study focused on compound surfactant for particle removal in post CMP cleaning, including selection of surfactant to compound, compound mechanism, and particle removal efficiency of compound surfactant. The wettability and stability of surfactants with different hydrophilic and hydrophobic groups were analyzed by contact angle and surface tension comparison. AES (1000 ppm) and JFC-E (2500 ppm) were selected for compounding research. The intermolecular interaction of compound surfactant was studied by analyzing the FTIR spectrum of surfactants on copper surface and the zeta potential of the particles in the cleaning solution. The intermolecular interaction parameters β m related to surface tension, and β s related to contact angle. The particle removal efficiency is closely related to the CMC and concentration of each component, and compound AES (1000 ppm) and JFC-E (2500 ppm) at volume ratio of 2:3 achieved the best particle removal efficiency. And it has certain guiding significance for the development of cleaning solution.

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Section: Resultsmentioning

confidence: 98%

Effect of Intermolecular Interaction of Compound Surfactant on Particle Removal in Post-Cu CMP Cleaning

Gao

Wang

et al. 2021

ECS J. Solid State Sci. Technol.

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“…Similar results were obtained on CPE and CPE/Na−Sa. According to the Randle Sevcick equation, this shows that the electrochemical process studied was governed by the mass transport of cbz from the bulk solution to the electrode surface . It was also noted for all these electrodes, a systematic displacement of the oxidation peak potential toward anodic values when the scanning rate increases.…”

Section: Resultsmentioning

confidence: 99%

Solvent Effect on the Grafting of an Organophilic Silane Onto Smectite‐type Clay: Application as Electrode Modifiers for Pesticide Detection

2017

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The effect of a non‐swelling (toluene) and a swelling (ethylene glycol (EG)) solvent on the grafting of an organophilic silane (octyltriethoxisilane) onto a smectitic clay was investigated. XRD patterns of the resulting materials reveals that the grafting occurred exclusively on the edges of the clay particles without intercalation, as evidenced by the non‐variability of the d‐value before and after the grafting. FTIR and TGA characterizations show that higher amount of silane was grafted when toluene was used as solvent. With EG, the clay particles were well‐dispersed and the grafting well controlled. These functionalized materials were used as carbon paste electrode modifiers to evaluate their abilities for electrochemical detection of organophilic pollutants at trace level. Carbendazim (cbz), a widely used fungicide was used as model compound. The clay functionalized in EG was the most efficient modifier, due to the combined effect of the characteristics of the pristine clay and the grafted silane. The electroanalysis experimental parameters were carefully optimized (pH 6.8, 15 min of accumulation time and 10 % of the modifier in the carbon paste). By varying cbz concentration, a 0.03 μM detection limit was obtained. The sensor provide very reproducible response but strongly affected by some metal ions interferences. By varying cbz concentration in river water, used as environmental sample model, higher detection limit was obtained (0.2 μM), due to interfering species.

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Contamination Removal From UV and EUV Photomasks

Venkatesh

Kim

Park

2017

Developments in Surface Contamination and Cleaning, Volume 9

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Addition of surfactants in ozonated water cleaning for the suppression of functional group formation and particle adhesion on the SiO2 surface

Cited by 11 publications

References 10 publications

Effect of Intermolecular Interaction of Compound Surfactant on Particle Removal in Post-Cu CMP Cleaning

Effect of Intermolecular Interaction of Compound Surfactant on Particle Removal in Post-Cu CMP Cleaning

Solvent Effect on the Grafting of an Organophilic Silane Onto Smectite‐type Clay: Application as Electrode Modifiers for Pesticide Detection

Contamination Removal From UV and EUV Photomasks

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