2010
DOI: 10.1134/s1063782610010161
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Active region based on graded-gap InGaN/GaN superlattices for high-power 440- to 470-nm light-emitting diodes

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Cited by 12 publications
(7 citation statements)
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“…The dependence of LED efficiency on thickness of LT-GaN between SL and QW is very strong at low thickness and nearly saturates around 10-15 nm, but some rise may be observed until 20-25 nm. The role of this LT-GaN seems to be the same as in previously reported blue LEDs [10]-just to prevent injected holes overflow from QW to InGaN/ GaN SL. The optimal value of undoped GaN barrier above the QW is about 5 nm.…”
Section: Optimization Of Deep-green Led Structurementioning
confidence: 72%
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“…The dependence of LED efficiency on thickness of LT-GaN between SL and QW is very strong at low thickness and nearly saturates around 10-15 nm, but some rise may be observed until 20-25 nm. The role of this LT-GaN seems to be the same as in previously reported blue LEDs [10]-just to prevent injected holes overflow from QW to InGaN/ GaN SL. The optimal value of undoped GaN barrier above the QW is about 5 nm.…”
Section: Optimization Of Deep-green Led Structurementioning
confidence: 72%
“…1) [10][11][12] by alternating growth of In 0.1 Ga 0.9 N and growth interruption (GI) where the alkyl precursors were switched off and the carrier gas composition was changed from pure N 2 to a mixture of N 2 :H 2 ¼7:3. In this procedure, the indium concentration on the surface is governed by an interplay between InGaN decomposition during the GI, indium segregation, desorption, and incorporation into InGaN during subsequent growth.…”
Section: Methodsmentioning
confidence: 99%
“…LEDs with SPSLs having graded and constant In content were investigated. It was shown that graded top SPSL leads to pronounced improvement of the emission efficiency [4], that can be explained by better hole injection [7]. Emission efficiencies of the LEDs with bottom SPSL having graded and constant In content were close.…”
Section: Resultsmentioning
confidence: 97%
“…The InGaN/GaN SPSLs in the investigated structures were formed using a InGaNconversion technique [4,5] by alternating growth of In 0.1 Ga 0.9 N and growth interruption (GI) where the alkyl precursors were switched off and the carrier gas composition was changed from pure N 2 to a mixture of N 2 :H 2 = 7:3. Thickness of each layer in the SPSL was ~1.…”
Section: Methodsmentioning
confidence: 99%
“…A Si-doped n-GaN layer is grown on buffer GaN layer. Short period superlattice (SPSL) with following low-temperature grown i-GaN barrier layer is grown over the n-GaN to improve emission efficiency as was shown both for blue and green LEDs [20,21]. The SPSL are grown, as described by Lundin et al, by conversion method [21].…”
Section: Device Structure and Experimentsmentioning
confidence: 99%