Acid catalyst mobility in resist resins

Abstract

Articles you may be interested inGas diffusion electrode setup for catalyst testing in concentrated phosphoric acid at elevated temperatures Rev. Sci. Instrum. 86, 024102 (2015); 10.1063/1.4908169Submillisecond post-exposure bake of chemically amplified resists by C O 2 laser spike annealing Effects of photoacid generator incorporation into the polymer main chain on 193 nm chemically amplified resist behavior and lithographic performance In a chemically amplified resist absorbed photons generate stable catalyst molecules instead of directly switching resist solubility via photochemical reaction. This allows for much lower exposure doses to be used in imaging. Some catalyst mobility is necessary to achieve amplification since the catalyst must move from reaction site to reaction site, but a mobile catalyst can blur the deposited aerial image. Catalyst molecules that are free to move in exposed regions are also free to move into adjacent unexposed regions. Understanding acid catalyst diffusion in photoresist resins is complicated by the constantly changing chemical environment the diffusing catalyst experiences as the resist undergoes chemical reactions. The diffusing catalyst promotes chemical reactions which change the properties of its surrounding resin. In addition, it is possible a transient material state is generated by volatile reaction byproducts and their desorption from the film. In most photoresist systems it is impossible to separate reaction and diffusion effects. This work describes studies of acid diffusion in polymers that are close structural analogs to reactive photoresist resins but do not react with the diffusing acidic catalyst. The purpose of this study into nonreactive polymer is to gain insight into the more complex, reactive systems. In addition, experiments with polymeric photoacid generators are reported. These materials provide added insight into acid transport in photoresist materials.

PAG segregation during exposure affecting innate material roughness

“…17 It was later shown that both anion-bound and cation-bound PAGs could be prepared and that cation-bound PAGs had increased sensitivity due to presumably higher rates of acid diffusion. 18 This work also noted that some degree of phase segregation occurred which could be explained by the choice of the more non-polar styrene as the second monomer.…”

Chain-Scission Polyethers for EUV Lithography

“…These properties, however, have been found to be inversely related, a relationship commonly referred to as the RLS trade-off [1]. To overcome the RLS trade-off, the lithographic community is investigating alternative resist platforms such as molecular glasses [2][3][4], polymer-bound photoacid generators (PAGs) [5][6][7], and chain-scission polymers [8][9][10][11][12][13][14][15][16][17][18][19][20][21].…”

LER Limitations of Resist Thin Films

“…[13][14][15][16][17][18][19][20] These polymerbound PAGs are designed to improve lithographic performance in two ways:…”