2016 IEEE Symposium on VLSI Technology 2016
DOI: 10.1109/vlsit.2016.7573362
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Achieving Sub-ns switching of STT-MRAM for future embedded LLC applications through improvement of nucleation and propagation switching mechanisms

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Cited by 16 publications
(7 citation statements)
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“…Real-time switching dynamics in STT-MRAM "switching" while in previous works these two phases were combined in a single global phase called "switching" [11]. The separation is important because in reality two successive phases occur as demonstrated in [11][12][13][14]. In the first phase, the nucleation of the domain wall, during what we call in this paper the "Preswitching time", spins are accumulated in the free layer and the nucleation takes place.…”
Section: A Shows a High-resolution Transmission Electronmentioning
confidence: 96%
“…Real-time switching dynamics in STT-MRAM "switching" while in previous works these two phases were combined in a single global phase called "switching" [11]. The separation is important because in reality two successive phases occur as demonstrated in [11][12][13][14]. In the first phase, the nucleation of the domain wall, during what we call in this paper the "Preswitching time", spins are accumulated in the free layer and the nucleation takes place.…”
Section: A Shows a High-resolution Transmission Electronmentioning
confidence: 96%
“…random access memory (MRAM) with large perpendicular magnetic anisotropy is attractive for its good scalability and high thermal stability [4,5] during fast sub-nanosecond write, [6] the required high write current density can exert severe stress on the magnetic tunnel junction (MTJ) and induce wear-out and breakdown of the MTJ barrier, [7] leading ultimately to degradation of the memory cell. Meanwhile, the shared read/write path can lead to write upon read errors.…”
Section: Energy-efficient Ultrafast Sot-mrams Based Onmentioning
confidence: 99%
“…[1] Au 0.25 Pt 0.75 is also thermally stable as indicated by the constant ρ xx and θ SH upon annealing to 400 °C. 2020, 6,1901131 The factor A ≈ exp(−d Hf /λ s,Hf ) denotes the attenuation of spin current by the Hf spacer layer (the thickness d Hf and the spin diffusion length λ s,Hf ) in between the spin Hall channel and the magnetic free layer of the magnetic tunnel junction. Electron.…”
Section: Direct Current Switchingmentioning
confidence: 99%
“…Note that the TRNG pulse-width can be much faster than 1 µs used in Figs. 2 and 4, since sub-nanosecond switching was reported for STT-MRAM [29]. A shorter time might allow for a higher TRNG throughput and a smaller Q n , hence a correspondingly smaller area of the integrating capacitor.…”
Section: Stt-mram Based Trngmentioning
confidence: 99%