Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle

Haye, Emile; Achour, Amine; Guerra, Abdelouadoud; Moulaï, Fatsah; Hadjersi, Toufik; Boukherroub, Rabah; Panepinto, Adriano; Brousse, Thierry; Pireaux, Jean Jacques; Lucas, Stéphane

doi:10.1016/j.electacta.2019.134890

Cited by 42 publications

(27 citation statements)

References 42 publications

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“…The potential candidates, such as transition metal nitrides, have excellent electrical conductivity and superior cycling stability that could be used in supercapacitor electrode materials. So, CrN thin films also have great potential for application in symmetric supercapacitors and other energy storage systems [ 77 , 78 , 79 , 80 ].…”

Section: Resultsmentioning

confidence: 99%

Tuning Surface Plasmonic Resonance and Surface Wettability of Au/CrN Films Using Nitrogen-Containing Gas

Wei

Tong²,

Chen

et al. 2022

Nanomaterials

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The surface plasmonic resonance, surface wettability, and related mechanical nanohardness and of face-centered-cubic (fcc) chromium nitride (CrN) films have been successfully manipulated via the simple method of tuning nitrogen-containing gas with different nitrogen-to-argon ratios, varying from 3.5 (N35), to 4.0 (N40), to 4.5 (N45), which is directly proportional to argon. All of the obtained CrN films showed that the surface wettability was due to hydrophilicity. All of the characteristics were mainly confirmed and explained by using X-ray diffraction (XRD) patterns, including plan-view and cross-section SEM images, with calculations of the average grain size performed via histograms accompanied by different preferred grain orientations. In the present work, not only the surface plasmonic resonance, but also the surface wettability and the related mechanical nanohardness of CrN films were found to be tunable via a simple method of introducing adjustable nitrogen-reactive-containing gas during the deposition process, while the authors suggest that the crystal orientation transition from the (111) to the (200) crystalline plane changed significantly with the nitrogen-containing gas. So the transition of the preferred orientation of CrN’s cubic close-packed from (111) to (200) varied at this composite, caused and found by the nitrogen-containing gas, which can be tuned by the nitrogen-to-argon ratio. The surface plasmonic resonance and photoluminescence quenching effects were coupled photon and electron oscillations, which could be observed, and which existed at the interface between the CrN and Au metals in the designed heterostructures.

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Section: Resultsmentioning

confidence: 99%

Tuning Surface Plasmonic Resonance and Surface Wettability of Au/CrN Films Using Nitrogen-Containing Gas

Wei

Tong²,

Chen

et al. 2022

Nanomaterials

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“…Because of their structural stability, unique physiochemical features, good electrocatalytic activities and superior electrical conductivity, metal nitrides are highly considered electrode material for ECs [12,13]. So far, nitride-based electrodes, such as TiN [14,15], VN [16][17][18][19], RuN [20], Mo 2 N [21][22][23], Govindarajan et al Nanoscale Research Letters (2022) 17:65 Ni 2 Mo 3 N [24], Ni 3 N [25], MnN@rGO [26] and CrN [27][28][29] electrodes, have been investigated for application in ECs. Molybdenum nitrides have been pursued as a viable electrode material for ECs owing to their great catalytic activity, excellent electrochemical behavior, low compressibility and high melting point.…”

Section: Introductionmentioning

confidence: 99%

Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors

et al. 2022

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Due to their outstanding power density, long cycle life and low cost, supercapacitors have gained much interest. As for supercapacitor electrodes, molybdenum nitrides show promising potential. Molybdenum nitrides, however, are mainly prepared as nanopowders via a chemical route and require binders for the manufacture of electrodes. Such electrodes can impair the performance of supercapacitors. Herein, binder-free chromium (Cr)-doped molybdenum nitride (Mo2N) TFEs having different Cr concentrations are prepared via a reactive co-sputtering technique. The Cr-doped Mo2N films prepared have a cubic phase structure of γ-Mo2N with a minor shift in the (111) plane. While un-doped Mo2N films exhibit a spherical morphology, Cr-doped Mo2N films demonstrate a clear pyramid-like surface morphology. The developed Cr-doped Mo2N films contain 0–7.9 at.% of Cr in Mo2N lattice. A supercapacitor using a Cr-doped Mo2N electrode having the highest concentration of Cr reveals maximum areal capacity of 2780 mC/cm2, which is much higher than that of an un-doped Mo2N electrode (110 mC/cm2). Furthermore, the Cr-doped Mo2N electrode demonstrates excellent cycling stability, achieving ~ 94.6% capacity retention for about 2000 cycles. The reactive co-sputtering proves to be a suitable technique for fabrication of binder-free TFEs for high-performance energy storage device applications. Graphical Abstract

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“…Besides their traditional use as hard protective coatings, conductive transition metal nitride (TMN) thin films are also employed in key technological sectors ranging from micro-and optoelectronics [1], optics [2] and plasmonics [3][4][5][6][7], biomedical [8][9][10][11], as well as energy storage and conversion [12][13][14] due to their good electrical and optical conductivity and chemical inertness. TMN thin films and coatings are usually produced by sputter-deposition, a physical-vapor deposition technique which enables the control of the film microstructure and residual stress by appropriate tuning of the process parameters, such as working pressure, substrate temperature, ion flux energy and density.…”

Section: Introductionmentioning

confidence: 99%

“…For some applications, it is required to produce films with enhanced surface area and porosity: e.g., in material electrodes to be integrated in supercapacitors [13,14] or in biocompatible coatings to ensure cell proliferation [10]. One can take advantage of film deposition at inclined or glancing incidence with respect to the substrate surface, known as offnormal or glancing angle deposition (GLAD) technique, to design unique film morphologies, typically consisting of inclined columns separated by intercolumnar porosity.…”

Section: Introductionmentioning

confidence: 99%

“…By setting the incoming particle flux at highly oblique angles with respect to the normal of the substrate, the growth mechanism is mainly governed by shadowing effects. Although numerous works have been dedicated to understand the columnar growth and texture development in off-normally deposited films [22][23][24][25], fundamental studies on TMN films deposited at GLAD conditions are relatively scarce [26,27], although promising properties have been recently achieved [13,14,28,29]. In particular, TiN films were found to exhibit a biaxial texture [30], in which the growing crystallites possess both a specific out-of-plane and in-plane preferred orientations.…”

Section: Introductionmentioning

confidence: 99%

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Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

Mareus

Mastail

Anğay

et al. 2020

Surface and Coatings Technology

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In this work, TiN, ZrN and HfN thin films fabricated using glancing angle deposition (GLAD) technique are studied both experimentally and by numerical simulations. The films (1 µm thickness) were deposited by reactive magnetron sputtering at 0.3 Pa and 300°C on Si substrates inclined at α=85° with respect to the target. The film morphology and crystal structure were characterized by scanning electron microscopy, atomic force microscopy and Xray diffraction (XRD), including pole figure measurements. The wettability of these coatings was investigated using the sessile drop method with three different liquids. It is shown that TiN, ZrN and HfN films have a cubic, NaCl-type crystal structure with a [111] out-of-plane orientation and exhibit a biaxial texture. XRD pole figures reveal that the crystal habit of the grains consists of {100} facets constituting triangular-base pyramids. The films develop columnar microstructures, with typical column widths of ~ 100 nm. The tilt angle β of the columns is found to increase from 24.5, 31.5 to 34° for TiN, ZrN and HfN films, respectively. Atomistic computations of the growth of these nitrides at glancing angle using a kinetic Monte Carlo model reveal that the growth morphology and variation in column tilt angle is well reproduced by considering the difference in the angular distribution of the sputtered particles.This study also shows that GLAD films are hydrophilic comparatively to the same films deposited at near-normal incidence, and among the three nitrides, TiN is the more wettable coating.

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Achieving on chip micro-supercapacitors based on CrN deposited by bipolar magnetron sputtering at glancing angle

Cited by 42 publications

References 42 publications

Tuning Surface Plasmonic Resonance and Surface Wettability of Au/CrN Films Using Nitrogen-Containing Gas

Tuning Surface Plasmonic Resonance and Surface Wettability of Au/CrN Films Using Nitrogen-Containing Gas

Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors

Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

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