2001
DOI: 10.1016/s0921-5107(00)00636-x
|View full text |Cite
|
Sign up to set email alerts
|

Absolute determination of the Fermi level pinning at the dielectric/semiconductor interface in GaAs based heterostructures

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2003
2003
2005
2005

Publication Types

Select...
3
1

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 7 publications
0
1
0
Order By: Relevance
“…Finally, the surface of the Hall structure is stabilized by coating it with a plasma enhanced chemical vapor deposited SiO 2 passivation layer. Constant Fermi-level transient spectroscopy 14 has revealed that GaAs/ SiO 2 interface states exhibit a U-shaped density of states with a minimum of ϳ3 ϫ 10 12 cm −2 / eV. At a sufficiently high temperature, the interface states are in thermal equilibrium with the electrons in the quantum well resulting in Fermi-level pinning around midgap and yielding highly reproducible sensitivity and temperature coefficients.…”
mentioning
confidence: 99%
“…Finally, the surface of the Hall structure is stabilized by coating it with a plasma enhanced chemical vapor deposited SiO 2 passivation layer. Constant Fermi-level transient spectroscopy 14 has revealed that GaAs/ SiO 2 interface states exhibit a U-shaped density of states with a minimum of ϳ3 ϫ 10 12 cm −2 / eV. At a sufficiently high temperature, the interface states are in thermal equilibrium with the electrons in the quantum well resulting in Fermi-level pinning around midgap and yielding highly reproducible sensitivity and temperature coefficients.…”
mentioning
confidence: 99%