A study of CdS thin-film deposition

Abstract

The CdS deposition is carried out in a modified vacuum furnace. The substrate is heated by radiation from the crucible heater, and the temperature distribution is properly controlled through a system of tubes and screens. It is found that the temperature gradient at the substrate is an important parameter determining the orientation of the samples. By controlling this parameter oriented films of high resistivity are obtained. The apparatus and operation are extremely simple.