A precision dose control circuit for vertically aligned carbon nanofiber based maskless lithography

Islam, Syed K.; Eliza, Sazia A.; Bull, Nora D; Rahman, Talha; Blalock, Benjamin J.; Baylor, L. R.; Ericson, M.N.

doi:10.1109/ivnc.2009.5271585

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7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Eliza

Islam

Rahman

et al. 2010

International Vacuum Nanoelectronics Conference

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This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2-4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.

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