1996
DOI: 10.1557/s0883769400032127
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A Path to Nanolithography

Abstract: Parallel or Sequential?It is yet unclear what type of new devices, if any, will replace the metaloxide field effect transistor in the sub-0.1-ju.m domain. Since in any case, the development of quantum-effect devices requires smaller and smaller dimensions for operation above temperatures of a few milliKelvin, we can safely assume that high-resolution patterning steps will always be required to manufacture the devices themselves. Alternative approaches (such as the use of self-assembling systems) have not yet r… Show more

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Cited by 55 publications
(37 citation statements)
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“…In comparison with quantum dots and wells, the advancement of 1D nanostructures has been slow until very recently, as hindered by the difficulties associated with the synthesis and fabrication of these nanostructures with well-controlled dimensions, morphology, phase purity, and chemical composition. Although 1D nanostructures can now be fabricated (in the setting of a research laboratory) using a number of advanced nanolithographic techniques, [22] such as electron-beam (e-beam) or focused-ion-beam (FIB) writing, [23] proximalprobe patterning, [24] and X-ray or extreme-UV lithography, [25] further development of these techniques into practical routes to large quantities of 1D nanostructures from a diversified range of materials, rapidly, and at reasonably low costs, still requires great ingenuity. In contrast, unconventional methods based on chemical synthesis might provide an alternative and intriguing strategy for generating 1D nanostructures in terms of material diversity, cost, throughput, and the potential for high-volume production.…”
Section: Reviewmentioning
confidence: 99%
“…In comparison with quantum dots and wells, the advancement of 1D nanostructures has been slow until very recently, as hindered by the difficulties associated with the synthesis and fabrication of these nanostructures with well-controlled dimensions, morphology, phase purity, and chemical composition. Although 1D nanostructures can now be fabricated (in the setting of a research laboratory) using a number of advanced nanolithographic techniques, [22] such as electron-beam (e-beam) or focused-ion-beam (FIB) writing, [23] proximalprobe patterning, [24] and X-ray or extreme-UV lithography, [25] further development of these techniques into practical routes to large quantities of 1D nanostructures from a diversified range of materials, rapidly, and at reasonably low costs, still requires great ingenuity. In contrast, unconventional methods based on chemical synthesis might provide an alternative and intriguing strategy for generating 1D nanostructures in terms of material diversity, cost, throughput, and the potential for high-volume production.…”
Section: Reviewmentioning
confidence: 99%
“…However, the so-called 100 nm barrier cannot be easily surmounted. Advanced lithographic techniques, such as extreme UV (EUV) lithography, soft X-ray lithography, e-beam writing, focused ion beam (FIB) writing, and proximal-probe lithography (74,75), have the capability of generating extremely small features (as small as a few nm), but their development for manufacturing of nanostructures requires substantial effort and they, as the conventional photolithography, are poorly suited for patterning non-planar surfaces.…”
Section: Methods For Planar Hydrogel Micropatterningmentioning
confidence: 99%
“…By nanolithography, nanostructures and their arrays are possible to fabricate by a directed or constrained growth from one to few nm with the advantage of producing large quantities of 1D nanostructures using a wide variety of the available materials [296][297][298][299][300].…”
Section: Production Technologiesmentioning
confidence: 99%