A novel process for plasma immersion ion implantation and deposition with ions from vaporization of solid targets

Abstract

A novel source for plasma immersion ion implantation and deposition (PIII&D) was developed in order to perform surface treatment of materials with ions from vaporization of solid targets. Usually this is obtained by means of beamline ion implanters, in which three dimensional implantation requires target manipulation, or by vacuum arc discharges, in which the presence of macroparticles is the main problem to be overcame. Samples of silicon wafers immersed in a lithium plasma produced by this source were submitted to low negative high frequency pulses (3‐4 kV/6 μs/3 kHz), causing lithium implantation and deposition. A very high strain and photoluminescence measured by high resolution X‐ray diffraction and Raman spectroscopy, respectively, were observed in the analyzed layers of the samples that were immersed in this plasma. XPS measurements revealed thick Li deposition for samples treated under conditions of high lithium vaporization rate. This novel process was effective for Li implantation/deposition and shows potential for PIII or PIII&D of many different elements from solid targets as Ca, K, Mg and Al. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Improved corrosion resistance of tool steel H13 by means of cadmium ion implantation and deposition

“…VAST is a plasma system used to vaporize a solid target, ionize the resultant vapor gas, and perform PIII&D in different substrates with such implanting elements. Besides cadmium, also aluminum, zinc and lithium [17,18] were already successfully implanted/deposited in distinct substrates in VAST for specific purposes.…”

Thin films growth by PIIID technique from hexamethyldisilazane/argon mixture

“…Although applications of plasma polymerization are of growing technological importance, the processes that take place in the plasma are poorly understood. PIIID is a highly efficient technique for surface modification of metals, semiconductors, ceramics and polymeric materials and on this account, it has been employed in different areas, such as aeronautics, optics, biomedics, coatings and electronics [6][7][8][9][10][11][12][13][14][15][16]. In this implantation and deposition process, the substrates (or samples) are immersed in the plasma and are polarized with high voltage pulses.…”