2012
DOI: 10.1109/tsm.2012.2190431
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A Novel Design Flow for Dummy Fill Using Boolean Mask Operations

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Cited by 2 publications
(1 citation statement)
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“…To address this, foundries typically place dummy patterns on masks (a process referred to as dummification) to improve uniformity of processes, such as, Deep Reactive Ion Etching, Photolithography, Chemical Mechanical Polishing, Depositions, or Metallization's [2]. A slight modulation of features on mask can alter the uniformity of processes that can have significant impact on device and circuit performance.…”
Section: Introductionmentioning
confidence: 99%
“…To address this, foundries typically place dummy patterns on masks (a process referred to as dummification) to improve uniformity of processes, such as, Deep Reactive Ion Etching, Photolithography, Chemical Mechanical Polishing, Depositions, or Metallization's [2]. A slight modulation of features on mask can alter the uniformity of processes that can have significant impact on device and circuit performance.…”
Section: Introductionmentioning
confidence: 99%