2007 IEEE International Electron Devices Meeting 2007
DOI: 10.1109/iedm.2007.4418935
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A Novel Cross-Spacer Phase Change Memory with Ultra-Small Lithography Independent Contact Area

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Cited by 19 publications
(9 citation statements)
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“…The scaling of 'RESET' current therefore becomes highly important for both energy reduction and density expansion. The traditional approaches for downscaling of 'RESET current is to shrink either the heater/PCM interfacial region [64], [65] or the PCM programming volume [66]- [68], leading to the advent of several advanced cell structures such as edge-contact [69], µTrench [70],] ringshaped [71], pillar [72], pore [73], cross-spacer [74], and dash cells [75] (Figure 8). According to the 'RESET' current comparsion among aforementioned cells, 'RESET' current was found to increase proportionally along with the effective contact diameter, as illustrated in Figure 9, and an average 'RESET' current density of ∼40 MA/cm 2 is required to program the RCRAM cell [68].…”
Section: Phase-change Memoriesmentioning
confidence: 99%
“…The scaling of 'RESET' current therefore becomes highly important for both energy reduction and density expansion. The traditional approaches for downscaling of 'RESET current is to shrink either the heater/PCM interfacial region [64], [65] or the PCM programming volume [66]- [68], leading to the advent of several advanced cell structures such as edge-contact [69], µTrench [70],] ringshaped [71], pillar [72], pore [73], cross-spacer [74], and dash cells [75] (Figure 8). According to the 'RESET' current comparsion among aforementioned cells, 'RESET' current was found to increase proportionally along with the effective contact diameter, as illustrated in Figure 9, and an average 'RESET' current density of ∼40 MA/cm 2 is required to program the RCRAM cell [68].…”
Section: Phase-change Memoriesmentioning
confidence: 99%
“…33 is to generate an ultra-small lithographic-independent contact area by substituting the thickness of both the PCM and the low-temperature oxide-spacer sidewalls for a μTrench width. [163,207] As the cross-spacer cell can scale both the electrode and the PCM to a smaller size, the ability to obtain a low reset current of 80 μA using 180 nm technology has been proven. [207] Furthermore, the dash cell in Fig.…”
Section: Other Miscellaneous Pcram Cellsmentioning
confidence: 99%
“…[163,207] As the cross-spacer cell can scale both the electrode and the PCM to a smaller size, the ability to obtain a low reset current of 80 μA using 180 nm technology has been proven. [207] Furthermore, the dash cell in Fig. 34, [208,209] Electron.…”
Section: Other Miscellaneous Pcram Cellsmentioning
confidence: 99%
“…52) There are various alternatives to the cells described in Fig. 4, such as a bottleneck cell 53) (which has a constricted thin chalcogenide layer), a pillar cell 54) (which has a small cylindrical chalcogenide bar), a cross-spacer cell, 55) a pore cell, 56) and a dash cell. [57][58][59] For example, the pore cell is fabricated utilizing a small pore that is formed during the semiconductor manufacturing process.…”
Section: Pcramsmentioning
confidence: 99%