A nanofactory by focused ion beam

Abstract

A focused ion beam (FIB) system is process equipment used to make a wide variety of small structures of various materials by irradiating a focused gallium ion beam of nanometer-order diameter to a surface of specimens and by utilizing spattering etching and ion beam induced deposition. In order to realize greater diversity of structures with use of the FIB system, we developed a technology of making three-dimensional structures by using gas assist etching, and a precision wheel stage to be used in the focused ion beam (FIB) system. Using these technologies with the FIB system, we achieved a nano processing machine which can be called a nano milling machine or a nano lathe.

Understanding the electron-stimulated surface reactions of organometallic complexes to enable design of precursors for electron beam-induced deposition

“…EBID also offers a number of advantages compared with other vacuum-based nanofabrication strategies such as ion beam-induced deposition (IBID), electron beam lithography (EBL), and extreme ultraviolet lithography (EUVL) that can also create nanostructures. In particular, EBID can create smaller features than IBID, with less amorphization and without ion implantation [5][6][7]. While EBID resolution is comparable to EBL and EUVL [8,9], it needs no resist layers or etching step for pattern transfer.…”

Hybrid manufacturing in micro/nano scale: A Review

“…[76][77][78] As a second process, heating was typically applied in addition to lithography and deposition. SII Nano Technology Inc. and Seiko Instruments Inc. developed a hybrid process to form 3D structures using gas assisted etching and FIB together with a precision wheel stage, as shown in Fig.…”

“…29. 76 The etching and wheel stages make this either a nano-milling machine or a nano-lathe in a vacuum environment, respectively. The advantage of this system is in realizing a greater variety of mechanical parts, which cannot be fabricated using existing MEMS technology.…”

Focused ion beam milling of gallium phosphide nanostructures for photonic applications

“…The same tool allows imaging [4,5], (gas assisted) milling [3][4][5][8][9][10][11][12][13][14][15][16][17][18][19], gas assisted deposition [3,15] and implantation [7] of a selected sample. Moreover, a wide range of materials such as semiconductors [8,10,17,19], metals [3,6,9], soft materials [4,5] and insulators [7,11,12,18] can be processed by FIB. In addition, it offers a maskless fabrication process combined with the possibility of very fine focusing and high resolution.…”

“…In addition, it offers a maskless fabrication process combined with the possibility of very fine focusing and high resolution. The combination of all these factors allows the fabrication of structures with complex geometries [10,18], small features down to sub-5 nm dimensions [5,19] and high aspect ratios [6]. However, when energetic ions hit the target, a variety of ion-solid interactions can occur, causing sputtering, surface amorphization, implantation, swelling, deposition, backscattering and nuclear reactions.…”