1978
DOI: 10.1063/1.90239
|View full text |Cite
|
Sign up to set email alerts
|

A model for the large-amplitude hysteresis in MIS structures on InSb

Abstract: Time-instability measurements of the capacitance-voltage (C-V) characteristics of InSb MIS devices show that the flatband voltage shift follows VG=K (V)  log(1+t/τ) and appears to be caused by tunneling of free carriers from the semiconductor surface into insulator traps. The analysis of such a mechanism emphasizes the influence of the semiconductor band-gap width on the values of K for InSb substrates at 77 °K leading to about a 100 times larger instability than silicon sustrates at 300 °K for an equal value … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
1
0
1

Year Published

1978
1978
2015
2015

Publication Types

Select...
6
1

Relationship

2
5

Authors

Journals

citations
Cited by 16 publications
(2 citation statements)
references
References 7 publications
0
1
0
1
Order By: Relevance
“…relaxation thermique des porteurs piégés dans l'oxyde ne peut être retenu dans le cadre des expériences effectuées ici [15]. Enfin [16].…”
Section: Etude Expérimentale Des Dérivesunclassified
“…relaxation thermique des porteurs piégés dans l'oxyde ne peut être retenu dans le cadre des expériences effectuées ici [15]. Enfin [16].…”
Section: Etude Expérimentale Des Dérivesunclassified
“…Various dielectrics and deposition methods, completed with adequate annealing procedures, have been investigat- The best transition, close to 100 Hz, between high and low frequency C( ) curves has been achieved with SiO, but interface state densities around Article published online by EDP Sciences and available at http://dx.doi.org/10.1051/rphysap:019780013012063700 1012 cm2 . eV-1 were measured, and a significant carrier trapping phenomenon due to high trap densities located in the insulator layers close to the interface, was observed on these structures [12]. Improvement of the surface characteristics and of the electrical breakdown of the insulator was obtained with CVD SiON.…”
Section: Processing Techniques -Single Crystals N Typementioning
confidence: 92%