A kinetic Monte Carlo simulation of film growth by physical vapor deposition on rotating substrates

Cho, Junghyun; Terry, Scott G.; LeSar, Richard; Levi, Carlos G.

doi:10.1016/j.msea.2004.09.015

Cited by 43 publications

(23 citation statements)

References 32 publications

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“…With the enhancement of temperature, atomic mobility will gradually increase, which will generate more and more activated atoms. These activated atoms will more easily fill in the inner voids of the film and lead to a denser and smoother film [24][25][26][27]. In addition, from the surface morphology shown in Figs.…”

Section: Discussionmentioning

confidence: 98%

Fabrication and ionic conductivity of amorphous Li–Al–Ti–P–O thin film

Chen

Tao

Zhao

et al. 2011

Journal of Non-Crystalline Solids

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Section: Discussionmentioning

confidence: 98%

Fabrication and ionic conductivity of amorphous Li–Al–Ti–P–O thin film

Chen

Tao

Zhao

et al. 2011

Journal of Non-Crystalline Solids

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“…Semi-empirical or analytical approaches have provided relevant information regarding film nanostructuration mechanisms; however, molecular dynamics (MD) [14] and MC [62,120,268] methods have provided further insights into the growth dynamics from atomistic and fundamental points of view. The MD approach considers the incorporation of single species onto a film one by one, describing in detail the trajectory of each particle by means of effective particle-surface interaction potentials.…”

Section: Methods To Model the Shadowing-dominated Growth Of Thin Filmsmentioning

confidence: 99%

Perspectives on oblique angle deposition of thin films: From fundamentals to devices

Barranco

Borrás

González‐Elipe

et al. 2016

Progress in Materials Science

600

436

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a b s t r a c tThe oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in vacuum or in the presence of a plasma, mechanistic simulations are critically revised, discussing well-established paradigms such as the tangent or cosine rules, and proposing new models that explain the growth of tilted porous nanostructures. In the second part, we present an extensive description of applications wherein oblique-angle-deposited thin films are of relevance. From there, we proceed by considering the requirements of a large number of functional devices in which these films are currently being utilized (e.g., solar cells, Li batteries, electrochromic glasses, biomaterials, sensors, etc.), and subsequently describe how and why these nanostructured materials meet with these needs.

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“…Moreover, if the peak is high enough, more cavities will appear in the film near the interface between film and substrate [18,19], which will weaken the stability of the film-substrate system, and the adhesion strength between the film and substrate is reduced [10]. Therefore, the film should be deposited on the substrate with the least roughness as possible.…”

Section: Effect Of the Roughness Of Substrate Surface On The First Prmentioning

confidence: 99%