2010
DOI: 10.1109/ted.2010.2051247
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A High-Speed Deep-Trench MOSFET With a Self-Biased Split Gate

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Cited by 43 publications
(15 citation statements)
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“…The other parameters of the MOSFET were not adversely affected by the introduction of this P+-n junction and the only appreciable change other than that of the gate charge was the decrease of the terminal voltage by 0.6V. Also, the principle of reducing the gate charge is different from [6], [7], and [8].…”
Section: Discussionmentioning
confidence: 99%
“…The other parameters of the MOSFET were not adversely affected by the introduction of this P+-n junction and the only appreciable change other than that of the gate charge was the decrease of the terminal voltage by 0.6V. Also, the principle of reducing the gate charge is different from [6], [7], and [8].…”
Section: Discussionmentioning
confidence: 99%
“…The principle of reducing the gate charge is different from [8], [9], and [13]. The reference [8], [9] makes the gatedrain charge change into the gate-source charge to reduce the gate-drain charge.…”
Section: B Transient Gate Chargementioning
confidence: 99%
“…Then the W-shaped gate trench structure [6], [7] is proposed to overcome this drawback. Another method is the use of a split-gate in trench [8], [9], which makes the gate-drain coupling change into gate-source coupling. The new trench structure with different gate oxide thickness and different gate electrode materials [10] is proved to be an effective way for reducing gate-drain charge.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, trench MOSFETs are known to suffer from high switching losses compared to lateral and vertical D-MOSFETs because of the gate-drain overlap inherent in the device architecture [6]. To solve this problem, concepts like the split-gate MOSFET [7] and the W-gated MOSFET have been developed [8]. These devices reduce the parasitic gate-drain capacitance by using the selective growth of thick oxides at the trench bottom.…”
Section: Introductionmentioning
confidence: 99%