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A novel reverse-conducting insulated-gate bipolar transistor (RC-IGBT) with an automatically controlled anode gate, named AG-RC-IGBT, is proposed in this paper, wherein a gate on the reverse IGBT is intrinsically off in the forward conduction state and can be automatically turned on in the reverse conduction state. Therefore, bidirectional conduction capability with snapback-free characteristics is achieved in the novel RC-IGBT. Depending on the parameters set on the reverse IGBT, its operation mode can be either like an antiparallel IGBT or like an antiparallel MOS-controlled thyristor (MCT). The antiparallel MCT mode can yield low snapback current densities and low ON-state voltages in both forward and reverse conductions. Two-dimensional numerical simulations show that snapback-free characteristics are obtained in the AG-RC-IGBT antiparallel with an IGBT by a 15-μm-wide half-pitch in both forward and reverse conduction states. The antiparallel MCT mode achieves low ON-state voltages of 0.97 and 1.6 V at the current density of 200 A/cm 2 in reverse and forward conduction states, respectively.

A lateral double-diffusion MOSFET with a uniform high-permittivity (HK) dielectric field plate (FP) is manufactured and presented in this letter. The HK dielectric FP is capable of cutting both electric peak fields at the channel p-n junction and the edge of FP, providing higher breakdown voltage (BV) based on a novel mechanism. The Pb(Zr 0.53 , Ti 0.47 )O 3 (PZT) is taken as the HK dielectric material for its large preanneal permittivity. The test results indicate that, based on two identical devices except for the dielectric material, the BV of the one with PZT FP is more than three times of that of the counterpart with a SiO 2 dielectric, approximately 350 and 100 V, respectively.Index Terms-Field plate (FP), high permittivity (HK), lateral double-diffusion MOSFET (LDMOS), potential distribution.

A breakdown voltage model based on the 2-D analytical model of the electric field distributions for the balanced and symmetric superjunction (SJ) MOSFET is presented and used to explain the different breakdown mechanisms as a function of column doping concentrations and widths. It is observed that breakdowns simultaneously occur along different electric field lines across some special symmetric points when the drift region is not fully depleted. Moreover, the minimum specific onresistance can be obtained when the ionization integrals along these electric field lines are both in unity. For a breakdown voltage larger than 600 V, the minimum specific on-resistance R on of the SJ structure can be reduced by larger than 13% compared with the "suboptimum" case in the previous literature. Comparisons of results from the proposed model and simulation data show that the approximation solution exhibits excellent accuracy. The dependence values of the breakdown voltages on charge imbalance and the transient characteristics are also discussed.

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An analysis of an improved superjunction structure with variation vertical doping profile (VVD-SJ) is presented in this brief. It features a better tradeoff between breakdown voltage (BV) and specific ON-resistance (R on ) than the prior art, due to a higher average doping concentration in columns. A simple 2-D electric field model of the VVD-SJ structure is derived based on charge superposition principle. Optimized results show that the specific ON-resistance of the VVD-SJ structure is reduced by ∼10%, compared with the SJ one under the same BV and aspect ratio. The mainstream multiple epitaxial growth and implantation technology is suitable to fabricate the VVD-SJ power MOSFET without extra process cost. Index Terms-Breakdown voltage (BV), electric field model, specific ON-resistance, variation vertical doping superjunction (VVD-SJ).Zhi Lin is currently pursuing the Ph.D. degree with the State

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