Abstract-Recent developments in the fabrication of GaAs integrated Schottky structures for applications above 100 GHz are presented. Two approaches are discussed; the fabrication of integrated circuits using a GaAs foundry service, coupled with the research based post-processing of these structures, and the fabrication of discrete and integrated Schottky structures using a bespoke research laboratory.
I. INTRODUCTIONLow capacitance GaAs Schottky diode technology is required for millimetre and sub-millimetre wave heterodyne receivers. Schottky diodes operate at both ambient and cryogenic temperatures and are uniquely able to cover the frequency range from DC to above 1 THz. Schottky diode technology has been evolving for many years and has traditionally been driven by the demands of radio astronomy and remote sensing of the atmosphere. Ground based applications, e.g. security imaging, are now increasing in importance. For these applications, Schottky based technology offers an attractive alternative to detectors and sources that require cryogenic cooling [1].Despite the growing demand for Schottky devices operating above 100 GHz, there remains limited availability within Europe and there is currently no space-qualified process available. The European Space Agency (ESA) has initiated a programme to investigate the use of the GaAs foundry service from United Monolithic Semiconductors (UMS) to fill the current gap between demand and availability (ESA AO/1-5084/06/NL/GLC). This programme aims to investigate the performance limitations of this GaAs foundry service and to explore ways of post-processing GaAs wafers to enhance device performance, for example, to reduce the dielectric loading around the anode to reduce the parasitic capacitance and the effect of dielectric loading. Using this approach, integrated Schottky structures have been designed for operation at frequencies upto 380 GHz.Schottky diode fabrication is a relatively simple process which can be established in a research environment using optical lithography with simple manual alignment, deposition and etching tools. Structures in which the Schottky contact is integrated with an embedding network can also be fabricated in such an environment. In fact, a small research laboratory,