A heater plate assisted bake/chill system for photoresist processing in photolithography

Chua, Hui Tong; Tay, Arthur; Wang, Y.; Wu, Xiaodong

doi:10.1016/j.applthermaleng.2008.05.024

Cited by 2 publications

(1 citation statement)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The temperature difference of the heater was mitigated by adjusting the distance of the heating element. Some researchers also studied the multi-zone heater to improve the temperature uniformity [17][18][19]. However, there is still a lack of studies about the comparisons between the single and multizone heaters.…”

Section: Introductionmentioning

confidence: 99%

Numerical evaluation on surface temperature uniformity of multi-zone and single-zone ceramic heaters with the electrostatic chuck

Lee

2021

J Mech Sci Technol

View full text Add to dashboard Cite

The present study aims to numerically analyze the surface temperature uniformity of the multi-zone/single-zone ceramic heaters because the temperature uniformity becomes important in the semiconductor process, in close association with increasing productivity, depending on the power of heaters and the coolant temperature. The extensive simulations were conducted by the commercial code of ANSYS Fluent (V.2020.R2). It was found that the maximum temperature differences between the center of the puck and edge were estimated to be 32 K and 25 K for the circle and ring-type single-zone heaters, respectively. Also, the temperature difference between the center of the puck and the edge increased with the power of the ceramic heater. When using the multi-zone heater, a temperature difference was predicted to be 4.73 K, showing a smaller variation in space. It is concluded that the multi-zone heater can yield a more uniform temperature field in the radial direction.

show abstract

Section: Introductionmentioning

confidence: 99%