2015
DOI: 10.1063/1.4916547
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A four-probe thermal transport measurement method for nanostructures

Abstract: Several experimental techniques reported in recent years have enabled the measurement of thermal transport properties of nanostructures. However, eliminating the contact thermal resistance error from the measurement results has remained a critical challenge. Here, we report a different four-probe measurement method that can separately obtain both the intrinsic thermal conductance and the contact thermal resistance of individual nanostructures. The measurement device consists of four microfabricated, suspended … Show more

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Cited by 37 publications
(26 citation statements)
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“…Representative thermal resistance measurement results are shown in Figure S2 of the Supporting Information. Compared to previous reports of four‐probe thermal transport measurements of nanowire and microwire samples, a modified analytical solution has been derived in this work to account for the finite contact width of the 2D sample in the data analysis, as explained in the Supporting Information, where Figure S3 (Supporting Information) also shows the use of angle‐resolved polarized Raman spectra to determine sample crystallographic orientation.…”
mentioning
confidence: 74%
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“…Representative thermal resistance measurement results are shown in Figure S2 of the Supporting Information. Compared to previous reports of four‐probe thermal transport measurements of nanowire and microwire samples, a modified analytical solution has been derived in this work to account for the finite contact width of the 2D sample in the data analysis, as explained in the Supporting Information, where Figure S3 (Supporting Information) also shows the use of angle‐resolved polarized Raman spectra to determine sample crystallographic orientation.…”
mentioning
confidence: 74%
“…Four‐Probe Thermal Measurement : The thermal transport measurements were performed with the sample located in a high‐vacuum variable‐temperature cryostat at temperatures less than or equal to 350 K to avoid sample degradation at higher temperatures . A detailed description of the measurement technique and uncertainty analysis is described in a previous publication . An improved analytical solution of four‐probe thermal measurements of 2D samples is described in the Supporting Information.…”
Section: Methodsmentioning
confidence: 99%
“…Vigorous efforts have been made to measure the thermal conductivity in micro-/nanoscale electronic materials, such as thin films [1][2][3], nanowires [4,5], superlattices (SLs) [6][7][8], and 2D semiconductors [9,10]. Among the many approaches developed in recent decades for thermal conductivity measurement in micro-/nanostructures, the most commonly used include the 3ω method [1,2], time-domain thermoreflectance (TDTR) [3,11,12], Transient Thermal Gratings (TTG) [13], Raman spectroscopy [14][15][16], and the four-probe thermal measurement method [17]. The 3ω method provides accurate measurement of cross-plane thermal conductivity, especially in bulk materials and low-κ dielectric films.…”
Section: Introductionmentioning
confidence: 99%
“…However, accurate calibration of Raman peak shift over a wide range of temperatures is necessary to achieve a satisfactory uncertainty of the measured thermal conductivity, and the materials to be measured must be Raman active and sensitive enough. The four-probe thermal measurement method can measure intrinsic thermal conductance and thermal contact resistance in individual nanostructures [4,17,30]. This method consists of four suspended metal lines that function as both resistive heaters and thermometers, with the sample bridging across the four micro-fabricated metal lines [17].…”
Section: Introductionmentioning
confidence: 99%
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