A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength

Wachulak, P.; Bartnik, A.; Fiedorowicz, Henryk; Feigl, Torsten; Jarocki, R.; Kostecki, J.; Rakowski, Rafał; Rudawski, Piotr; Sawicka, Magdalena; Szczurek, M.; Szczurek, Anna; Zawadzki, Z.

doi:10.1007/s00340-010-4076-9

Cited by 34 publications

(29 citation statements)

References 14 publications

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“…k = 13.2 nm wavelength radiation from Ni-like cadmium EUV laser allowed for a sub-38 nm resolution nano-imaging [7]. A quasimonochromatic emission from a laser-plasma EUV source based on a gas puff target [8] allowed for sub-70 nm spatial resolution imaging [9,10] in a very compact system. A quasi-monochromatic emission from an incoherent SXR source, at much shorter wavelength, k = 2.88 nm, in the ''water-window'' spectral range, based on the liquid nitrogen, allowed to demonstrate SXR microscopy with a sub-50 nm spatial resolution [11].…”

Section: Introductionmentioning

confidence: 99%

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

et al. 2013

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We report on a compact, desktop size, laboratory type microscopy setup, based on a short wavelength gas puff target soft X-ray source, which emits incoherent radiation in ''water-window'' spectral range. The microscope employs a Wolter type I reflective objective and allows capturing magnified images of objects with *1-lm spatial resolution and exposure time as low as 5 s. A detailed characterization and optimization of both the source and the microscope setups are presented and discussed.

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Section: Introductionmentioning

confidence: 99%

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

et al. 2013

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“…47, will be discussed in this section. Three dimensional images were obtained from Gabor holo− grams recorded in the photoresist after exposure using the CDL.…”

Section: D Holographic Imaging At Euv Wavelengthsmentioning

confidence: 99%

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Wachulak

Marconi

Isoyan

et al. 2012

Opto-Electronics Review

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Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.

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“…It was also possible to develop the entire family of laser radiation sources with different spectral, energy and time characteristics. In addition, the research studies carried out on detection systems including systems of target observation, detection, identification and tracking (with use of the spectrum ranging from ultraviolet through terahertz) have led to the development of optoelectronic security systems, object control systems (including fire control), on-board data analysis systems, tracking warheads, training simulators and thermovision systems [7][8][9].…”

Section: Military Applications Of Lasersmentioning

confidence: 99%

Lasers in the dual use technologies

Mierczyk¹

2012

Bulletin of the Polish Academy of Sciences: Technical Sciences

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Abstract. In the more developed countries the use of modern technologies in the national economy is a general process allowing joint funding of a security research and development by both sources, state and private. The last one is especially involved in applications of modern technologies. One of the examples of important modern technologies being under development in many countries are dual-use technologies, which include IT technologies, sensors, effective energy sources, material science, nanotechnology, micro-and nano-electronics, photonics, biotechnology and quantum medicine.In this paper chosen technologies fulfilling the needs of the military technique and security monitoring systems, which have found their applications in the different branches of industry like power engineering, transportation, construction industry, metrology, protection of environment and the medicine, are discussed. The examples include the devices and lasers systems for different threats monitoring, which have been developed at the Military University of Technology. The research studies carried out on the analysis of various materials based on their spectroscopic characteristics: absorption, emission, dispersion, polarization and fluorescence in different mediums have led to the development of laser telemetry devices, environment monitoring devices and spatial imagery, as well as devices for medical diagnostics and therapy. Mentioned systems are composed of functional modules, which were developed to meet the real needs. These systems can be expanded further by addition of extra detectors of chemical materials and physical properties, and improving measuring functions and data transmission and processing.

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A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength

Cited by 34 publications

References 14 publications

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Lasers in the dual use technologies

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