Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Abstract

Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.

Development of a compact laser-produced plasma soft X-ray source for radiobiology experiments

“…Among them, for examples, were production of efficient EUV [24] and X-ray [25] emissions for lithography [26], metrology [27,28], microscopy [29][30][31], radiography [32,33], tomography [34], micromachining [35,36], processing materials [37], etc. Similar techniques with modifications in the experimental setup have been used to develop a source dedicated for radiobiology experiments.…”