A 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth

Wachulak, P.; Bartnik, A.; Fiedorowicz, Henryk; Kostecki, J.

doi:10.1364/oe.19.009541

Cited by 46 publications

(35 citation statements)

References 19 publications

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“…Blue solid line with data points shows the experimentally obtained KEF, from which the half-pitch resolution of 1. Second parasitic parameter that influences the spatial resolution, which was previously studied in EUV microscopy and reported in [10], is a thickness of the object. Owing to the fact that sometimes the thickness of the object is much larger than the depth of focus (DOF), it causes the resolution to be much worse, that for the case of ''thin'' object.…”

Section: Discussion Of the Resultsmentioning

confidence: 99%

“…k = 13.2 nm wavelength radiation from Ni-like cadmium EUV laser allowed for a sub-38 nm resolution nano-imaging [7]. A quasimonochromatic emission from a laser-plasma EUV source based on a gas puff target [8] allowed for sub-70 nm spatial resolution imaging [9,10] in a very compact system. A quasi-monochromatic emission from an incoherent SXR source, at much shorter wavelength, k = 2.88 nm, in the ''water-window'' spectral range, based on the liquid nitrogen, allowed to demonstrate SXR microscopy with a sub-50 nm spatial resolution [11].…”

Section: Introductionmentioning

confidence: 99%

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Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

et al. 2013

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We report on a compact, desktop size, laboratory type microscopy setup, based on a short wavelength gas puff target soft X-ray source, which emits incoherent radiation in ''water-window'' spectral range. The microscope employs a Wolter type I reflective objective and allows capturing magnified images of objects with *1-lm spatial resolution and exposure time as low as 5 s. A detailed characterization and optimization of both the source and the microscope setups are presented and discussed.

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Section: Discussion Of the Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

et al. 2013

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“…The spectral distribution as could be expected is relatively narrow, however, for some applications, especially micro− scopic imaging using Fresnel zoneplates [16][17][18], mono− chromatic radiation is necessary. In this case the multilayer collector can be employed not only for the EUV focusing, but also for spectral selection of an isolated line.…”

Section: (B)mentioning

confidence: 99%

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Bartnik

2015

Opto-Electronics Review

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In this work a review of investigations concerning interaction of intense extreme ultraviolet (EUV) and soft X-ray (SXR) pulses with matter is presented. The investigations were performed using laser-produced plasma (LPP) EUV/SXR sources based on a double stream gas puff target. The sources are equipped with dedicated collectors allowing for efficient focusing of the EUV/SXR radiation pulses. Intense radiation in a wide spectral range, as well as a quasi-monochromatic radiation can be produced. In the paper different kinds of LPP EUV/SXR sources developed in the Institute of Optoelectronics, Military University of Technology are described.Radiation intensities delivered by the sources are sufficient for different kinds of interaction experiments including EUV/SXR induced ablation, surface treatment, EUV fluorescence or photoionized plasma creation. A brief review of the main results concerning this kind of experiments performed by author of the paper are presented. However, since the LPP sources cannot compete with large scale X-ray sources like synchrotrons, free electron lasers or high energy density plasma sources, it was indicated that some investigations not requiring extreme irradiation parameters can be performed using the small scale installations. Some results, especially concerning low temperature photoionized plasmas are very unique and could be hardly obtained using the large facilities.

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“…64 and Ref. 65. It uses a quasi−monochromatic, compact, high repetition rate, laser−plasma EUV source based on a gas puff target, discussed in Sect.…”

Section: Incoherent Euv Microscopy With Zone Plate Opticsmentioning

confidence: 99%

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

Wachulak

Marconi

Isoyan

et al. 2012

Opto-Electronics Review

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Imaging systems with nanometer resolution are instrumental to the development of the fast evolving field of nanoscience and nanotechnology. Decreasing the wavelength of illumination is a direct way to improve the spatial resolution in photon-based imaging systems and motivated a strong interest in short wavelength imaging techniques in the extreme ultraviolet (EUV) region. In this review paper, various EUV imaging techniques, such as 2D and 3D holography, EUV microscopy using Fresnel zone plates, EUV reconstruction of computer generated hologram (CGH) and generalized Talbot self-imaging will be presented utilizing both coherent and incoherent compact laboratory EUV sources. Some of the results lead to the imaging with spatial resolution reaching 50 nm in a very short exposure time. These techniques can be used in a variety of applications from actinic mask inspection in the EUV lithography, biological imaging to mask-less lithographic processes in nanofabrication.

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A 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth

Cited by 46 publications

References 19 publications

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

Water-window microscopy using a compact, laser-plasma SXR source based on a double-stream gas-puff target

Laser-plasma extreme ultraviolet and soft X-ray sources based on a double stream gas puff target: interaction of the radiation pulses with matter

Aspects of nanometer scale imaging with extreme ultraviolet (EUV) laboratory sources

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