55.1: Invited Paper: FMM‐free OLED Manufacturing Enabled by Photolithographic Patterning Processes

Abstract

Resolution and brightness are the essential figure‐of‐merits for the microdisplay development needed for AR and VR applications. In this presentation, we show our technology development toward high‐resolution FMM‐free direct R‐G‐B OLED microdisplays. We show the schematic fabrication setup and integration route to fabricate red, green, and blue OLED pixels side‐by‐side by the OLED photolithographic patterning processes. We demonstrate a 1µm line and space feature with the photoresist and transfer the pattern to an OLED stack. With the high resolution of photoresist, high aperture ratio, and high‐resolution multicolor OLED pixel arrays are demonstrated. We also investigate the possible OLED degradations induced in the photolithography process. With the innovations in the process steps, OLED stacks, process environments, and photoresists, we demonstrate a breakthrough in the reliability of photolithography patterned OLED.

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

“…f Comparisons of the previously reported resolution of full-color OLED arrays with our work (refs. 45 – 55 ). …”

“…4d). Thanks to this superior patterning capability of the SI-OLES, furthermore, the full-color SI-OLED array corresponding to 949 ppi was successfully achieved, exhibiting the highest resolution compared to the reported full-color OLED arrays via various OLED patterning methods [45][46][47][48][49][50][51][52][53][54][55] (Fig. 4e, f and Supplementary Fig.…”

Solid-State Lighting Using Side-by-Side White Phosphorescent Organic Light-Emitting Diodes

“…Current methods for S×S organic device patterning include vacuum deposition through fine metal shadow masks, direct patterning via organic vapor-jet printing, solution processing using ink-jet printing or microchannels, film transfer via laser-induced thermal imaging, and postdeposition processing via chemical lift-off. − A somewhat less complex and damage-free method that can achieve photolithographic resolution is mechanical peel-off, which has recently been demonstrated for patterning organic photovoltaics and perovskite light-emitting devices. , In this work, we demonstrate two-color, S×S WOLEDs deposited via vacuum thermal evaporation and subsequently patterned using mechanically peeled-off films. This method allows for multilayer patterning with micron-scale resolution while avoiding precise alignment of shadow masks, or exposing the individual color-emitting stripes to destructive solvents used in conventional photolithography.…”

High-Resolution Patterning of Organic Emitting-Layer by Using Inkjet Printing and Sublimation Transfer Process

“…The color filter method has a decrease in brightness due to the device structure [16]. Fine metal mask and photolithography methods, which are direct patterning methods, also accompany a shadow effect from the distance between substrates [17,18] and chemical limitations such as damage to organic materials caused by process characteristics [19,20]. In our previous research, we showed the possibility of fabricating high-resolution patterns with high stability through solution and evaporation hybrid technology [4,21,22].…”