GaAs IC Symposium. IEEE Gallium Arsenide Integrated Circuit Symposium. 21st Annual. Technical Digest 1999 (Cat. No.99CH36369)
DOI: 10.1109/gaas.1999.803754
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40 Gbit/s optical communications: InP DHBT technology, circuits and system experiments

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Cited by 6 publications
(3 citation statements)
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“…High performance InP/InGaAs DHBT's grown by chemical beam epitaxy (CBE) have been reported with 180 GHz f T , 185 GHz f MAX , a gain of 50 at a current density of 1x105 A.cm -2 , a breakdown voltage>5 V [1]. These features are required for circuits found in 40 Gb/s IC's.…”
Section: Introductionmentioning
confidence: 99%
“…High performance InP/InGaAs DHBT's grown by chemical beam epitaxy (CBE) have been reported with 180 GHz f T , 185 GHz f MAX , a gain of 50 at a current density of 1x105 A.cm -2 , a breakdown voltage>5 V [1]. These features are required for circuits found in 40 Gb/s IC's.…”
Section: Introductionmentioning
confidence: 99%
“…1). As previously described [4], the transistors have been fabricated on CBE-grown epitaxial structure, and include a composite InGaAshGaAsPhP collector to minimise the collector current blocking effects, a highly Cdoped graded base and an InP emitter. The use of a graded base eases the HBT scaling and 0-7803-6550-X/00/$10.0002000 IEEE.…”
Section: Technologymentioning
confidence: 99%
“…As already described [4], the transistors ( Fig. 1) are fabricated on CBE-grown epitaxial structure, and include an InP emitter, a highly C-doped graded base, and a composite InGaAshGaAsPnnP collector, to minimize the collector current blocking effect.…”
Section: The Improved 1ngaashp Dhbt Technologymentioning
confidence: 99%