2009 IEEE Workshop on Microelectronics and Electron Devices 2009
DOI: 10.1109/wmed.2009.4816143
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3D Simulation Study of Cell-Cell Interference in Advanced NAND Flash Memory

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Cited by 17 publications
(7 citation statements)
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“…As the technology continues to scale down and, hence, adjacent cells become closer, the parasitic coupling capacitance between adjacent cells continues to increase and results in increasingly severe cell-to-cell interference. Recent studies [8]- [10] have clearly identified cell-to-cell interference as the major challenge for future NAND Flash memory scaling.…”
Section: B Cell-to-cell Interferencementioning
confidence: 99%
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“…As the technology continues to scale down and, hence, adjacent cells become closer, the parasitic coupling capacitance between adjacent cells continues to increase and results in increasingly severe cell-to-cell interference. Recent studies [8]- [10] have clearly identified cell-to-cell interference as the major challenge for future NAND Flash memory scaling.…”
Section: B Cell-to-cell Interferencementioning
confidence: 99%
“…By letting denote the expected threshold voltage of the th interfering cell after programming and denote the mean of the erased state, we can predict the cell-to-cell interference experienced by the victim cell as (10) By letting denote the target verify voltage of the victim cell in programming operation, we can predistort the victim cell by shifting the verify voltage from to . Through such data predistortion processing, we can expect that the threshold voltage of the victim cell will be shifted toward its desired location after the occurrence of cell-to-cell interference.…”
Section: Technique Ii: Data Predistortionmentioning
confidence: 99%
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“…This is referred to as cell-to-cell interference, which has been well recognized as the one of major noise sources in NAND flash memory [17][18][19]. Threshold voltage shift of a victim cell caused by cell-to-cell interference can be estimated as [16] …”
Section: Cell-to-cell Interferencementioning
confidence: 99%
“…All this has, however, remained speculative as the degradation of I -V characteristics is a complicated process involving Q FG shift, the generation of Q OX , and the interface states. Since NAND Flash memory cells are getting less reliable because of reduction of cell capacitance due to the gate area scaling and enlargement of neutral V t distribution by short and narrow channel effects, it is now crucial to obtain more qualitative insights into the origin of the degradation in reliability [11]- [13]. In this paper, to make the quantitative study about the degradation of gate oxide by the P/E cycles, a new method to extract net Q FG and vertical profile of Q OX is proposed.…”
Section: Introductionmentioning
confidence: 99%