3D Laser Nanoprinting of Functional Materials

Abstract

Abstract3D laser nanoprinting represents a revolutionary manufacturing approach as it allows maskless fabrication of 3D nanostructures at a resolution beyond the optical diffraction limit. Specifically, it endows the printed structures novel physical, chemical, or mechanical properties not observed at macroscopic scale. However, 3D laser nanoprinting typically relies on the photopolymerization process, indicating its limitation on the printable materials and functionalities. The capability to print diverse functional materials beyond polymer will enable a lot of new device applications in nanophotonics, microelectronics, and so on. One of the strategies is to use the 3D‐printed polymer structures as skeletons for functional material deposition, while another is to mix the functional components with the photocurable molecules and print the nanocomposites. More recently, several laser nanoprinting techniques beyond photopolymerization are also developed. In this review, the cutting‐edge technical innovation is summarized and a couple of examples are highlighted showing exciting applications of the printed structures in magnetic microrobots, photonics, and optoelectronics. Finally, the vision for existing challenges and future development in this field is shared.

Postsynthetic Photochemical Modification and 2D Structuring of Zr‐MOF Thin Films Containing Benzophenone Linker Molecules

“…refractive index or electrical conductivity. In addition, the resolution could be further increased by using more sophisticated techniques, such as multiphoton absorption, which allows 3D structuring in the nanometer range, [42] thus enabling the realization of complex sensor devices in a single film, areas that we are also currently pursuing.…”

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

“…[67,106] Several combinations of monomer/oligomer and photoinitiators have been investigated in TPL. [107][108][109] Like the case in UV lithography, there are both positive and negative TPL photoresists. The most widely used and tested are negatives photoresists, [110][111][112] in which two-photon exposure of the photoresist results in a cross-linked or polymerized 3D structure, allowing the uncured photoresist to be washed away after printing.…”

“…[ 67,106 ] Several combinations of monomer/oligomer and photoinitiators have been investigated in TPL. [ 107–109 ]…”

Postsynthetische Photochemische Modifizierung und 2D Strukturierung von Zr‐MOF Dünnfilmen mit Benzophenon Linkermolekülen

“…des Brechungsindex oder der elektrischen Leitfähigkeit führen. Darüber hinaus könnte die Auflösung weiter erhöht werden, indem anspruchsvollere Techniken wie die Multiphotonenabsorption eingesetzt werden, die eine 3D‐Strukturierung im Nanometerbereich ermöglicht [42] . Ein solcher Ansatz könnte die Realisierung komplexer Sensorbauteile in einem einzigen Film ermöglichen, ein Bereich, den wir derzeit ebenfalls verfolgen.…”