2008
DOI: 10.1016/j.microrel.2008.06.022
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3D electro-thermal investigations for reliability of ultra low ON state resistance power MOSFET

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Cited by 17 publications
(5 citation statements)
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“…The objective was to simulate and map the temperature increase inside the device during an electrical pulse based on previous electrical simulations [18]. For a 90 A electrical pulse lasting 5.7 ms with a metallization in its initial state, a maximum temperature of 172°C was attained in the middle of the Al layer (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…The objective was to simulate and map the temperature increase inside the device during an electrical pulse based on previous electrical simulations [18]. For a 90 A electrical pulse lasting 5.7 ms with a metallization in its initial state, a maximum temperature of 172°C was attained in the middle of the Al layer (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…3b,d). Typically, successive shortcircuits of several tens of microseconds induce temperature gradients on the order of 200°C [12].…”
Section: Al Metallization Outside Of the Bonding Areamentioning
confidence: 99%
“…In the SJ TMOSFET equivalent resistance model (see Fig. 15) [12], [14], mesh resistance is caused by the source metal located at the uppermost area; the drift resistance at the SJ TMOSFET and resistance at the bonding is modeled as an array. Every node point at the resistor array located at the source metal (for a distributed resistance) is connected to the source (see Fig.…”
Section: Simulations and Analysesmentioning
confidence: 99%