2016
DOI: 10.1117/12.2225037
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3D avalanche multiplication in Si-Ge lateral avalanche photodiodes

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Cited by 3 publications
(2 citation statements)
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“…Aforementioned Si-Ge APDs adopt vertical SACM structure, which requires to epitaxially grow an additional silicon charge layer. In order to reduce the device fabrication complexity, lateral SACM APDs have been demonstrated, in which the charge and multiplication regions are on one silicon layer [106][107][108][109]. Martinez et al proposed a lateral SACM APD with a breakdown voltage of more than 30 V and a GBP of 432 GHz as shown in Fig.…”
Section: Lateral Sacm Apdmentioning
confidence: 99%
“…Aforementioned Si-Ge APDs adopt vertical SACM structure, which requires to epitaxially grow an additional silicon charge layer. In order to reduce the device fabrication complexity, lateral SACM APDs have been demonstrated, in which the charge and multiplication regions are on one silicon layer [106][107][108][109]. Martinez et al proposed a lateral SACM APD with a breakdown voltage of more than 30 V and a GBP of 432 GHz as shown in Fig.…”
Section: Lateral Sacm Apdmentioning
confidence: 99%
“…As shown in Fig. 1, the LAPD is different from a conventional LAPD in structure, and no electrode is present in the Ge region [4,14] . Our structure also has a unique Si mesa in the Ge absorption region to modulate the field distribution in the device.…”
Section: Introductionmentioning
confidence: 99%