The platform will undergo maintenance on Sep 14 at about 7:45 AM EST and will be unavailable for approximately 2 hours.
2017
DOI: 10.1021/acs.nanolett.7b01248
|View full text |Cite
|
Sign up to set email alerts
|

Observing Imperfection in Atomic Interfaces for van der Waals Heterostructures

Abstract: Abstract:Vertically stacked van der Waals heterostructures are a lucrative platform for exploring the rich electronic and optoelectronic phenomena in two-dimensional materials. Their performance will be strongly affected by impurities and defects at the interfaces. Here we present the first systematic study of interfaces in van der Waals heterostructure using cross sectional scanning transmission electron microscope (STEM) imaging. By measuring interlayer separations and comparing these to density functional t… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

5
57
0

Year Published

2018
2018
2024
2024

Publication Types

Select...
8
2

Relationship

2
8

Authors

Journals

citations
Cited by 72 publications
(67 citation statements)
references
References 33 publications
(81 reference statements)
5
57
0
Order By: Relevance
“…The thickness of hBN was selected to be 4-3 layers to allow for large bias voltages without sample overheating. These structures have been produced using the dry-stacking method in an argon environment [20] to provide atomically clean and sharp interfaces, and to avoid InSe degradation [21,22]. The assembled stacks were deposited on an oxidized silicon wafer and contacts were defined using electron beam lithography (see supplementary information).…”
Section: Resultsmentioning
confidence: 99%
“…The thickness of hBN was selected to be 4-3 layers to allow for large bias voltages without sample overheating. These structures have been produced using the dry-stacking method in an argon environment [20] to provide atomically clean and sharp interfaces, and to avoid InSe degradation [21,22]. The assembled stacks were deposited on an oxidized silicon wafer and contacts were defined using electron beam lithography (see supplementary information).…”
Section: Resultsmentioning
confidence: 99%
“…At the same time, sub-and superstrates to the active TMD monolayers have been demonstrated to enable a wide range of tuning possibilities of the electronic and optical properties of the gain medium [8,[19][20][21]. In particular, pre-structured dielectric and plasmonic environments allow to tailor the local carrier landscape similar to how the photonic landscape can be formed by structuring a photonic crystal [22][23][24]. Combined advancements in the understanding of material properties and fabrication techniques hold enticing possibilities for integrated photonics applications and light sources.…”
Section: Introductionmentioning
confidence: 99%
“…1014 Furthermore, the energetic tendency to maximize the contact area seems to drive self-cleaning within the vdW gap, 15 enabling atomically pure interfaces. However, it is much more challenging to obtain sufficiently clean, ordered, and thin layers of lower-dimensional structures owing to their higher chemical reactivity.…”
mentioning
confidence: 99%