The platform will undergo maintenance on Sep 14 at about 7:45 AM EST and will be unavailable for approximately 2 hours.
2012
DOI: 10.1088/0963-0252/21/2/024001
|View full text |Cite
|
Sign up to set email alerts
|

160 GHz Gaussian beam microwave interferometry in low-density rf plasmas

Abstract: 160 GHz Gaussian beam microwave interferometry is realized for electron density analysis in low pressure rf plasmas. Measurement of electron densities lower than 10 16 m −3 with corresponding phase shift less than 0.3 • demands high stability of the interferometer frequency and minimum disturbance due to external interfering voltages and mechanical vibrations of the optical components. The interferometer consists of a frequency stabilized (phase lock loop) heterodyne system operating at a frequency of f MWI = … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
22
0

Year Published

2012
2012
2022
2022

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 31 publications
(23 citation statements)
references
References 21 publications
(30 reference statements)
1
22
0
Order By: Relevance
“…The vacuum chamber is already described by Dittmann et al [44]. The complete setup with the used diagnostics is shown in figure 1.…”
Section: Vacuum Chamber and Discharge Arrangementmentioning
confidence: 99%
See 2 more Smart Citations
“…The vacuum chamber is already described by Dittmann et al [44]. The complete setup with the used diagnostics is shown in figure 1.…”
Section: Vacuum Chamber and Discharge Arrangementmentioning
confidence: 99%
“…The experimental setup is similar to the gaseous electronics conference (GEC) reference cell [43]. The vacuum chamber is already described by Dittmann et al [44]. The complete setup with the used diagnostics is shown in figure 1.…”
Section: Vacuum Chamber and Discharge Arrangementmentioning
confidence: 99%
See 1 more Smart Citation
“…The rf electrode was powered via a matching network in cw or pulsed mode operation by a 13.56 MHz generator at forward power from 5 to 150 W. Due to the larger grounded electrode (rf electrode shielding and chamber wall) an asymmetric rf discharge with self-bias voltage from -100 to -600 V is generated, [2,14]. The vacuum pumping and gas supply system allowed a base pressure of 5 × 10 −5 Pa, whereas the plasma process is driven by a pressure of between 5 and 100 Pa at a constant gas flow rate of 5 sccm.…”
Section: Experimental Setup and Diagnosticsmentioning
confidence: 99%
“…The vacuum pumping and gas supply system allowed a base pressure of 5 × 10 −5 Pa, whereas the plasma process is driven by a pressure of between 5 and 100 Pa at a constant gas flow rate of 5 sccm. The rf electrode was powered via a matching network in cw or pulsed mode operation by a 13.56 MHz generator at forward power from 5 to 150 W. Due to the larger grounded electrode (rf electrode shielding and chamber wall) an asymmetric rf discharge with self-bias voltage from -100 to -600 V is generated, [2,14]. The MW interferometer for electron density analysis consists of a frequency stabilized (PLL) heterodyne system operating at a frequency of 160.28 GHz with output power of 1.3 mW, [14].…”
Section: Experimental Setup and Diagnosticsmentioning
confidence: 99%