2017 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS) 2017
DOI: 10.1109/csics.2017.8240431
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10W power amplifier and 3W transmit/receive module with 3 dB NF in Ka band using a 100nm GaN/Si process

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Cited by 52 publications
(7 citation statements)
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“…S 11 of the resulting drain equivalent circuit is shown as a green trace in Fig. 2 (28)(29)(30)(31)(32)(33)(34)(35)(36)(37)(38). The goal in the following will be to design an ISMN that achieves 85% of the maximum P out and PAE in the frequency band of interest.…”
Section: Technology and Devicementioning
confidence: 99%
“…S 11 of the resulting drain equivalent circuit is shown as a green trace in Fig. 2 (28)(29)(30)(31)(32)(33)(34)(35)(36)(37)(38). The goal in the following will be to design an ISMN that achieves 85% of the maximum P out and PAE in the frequency band of interest.…”
Section: Technology and Devicementioning
confidence: 99%
“…The technology selected for the project is the D01GH process from OMMIC: a 100 nm gate-length GaN-on-Si HEMT process with which different designs at the target frequencies have been successfully demonstrated in literature [2,4,5,41]. At European level and among commercial processes, this one features the shortest gate-length even if, for space applications, working with a Si substrate, rather than SiC, may represent an issue.…”
Section: Technologymentioning
confidence: 99%
“…Process design kit (PDK) is available for this process, both for Keysight ADS (adopted in this work) and NI AWR-MWO design suites, including electro-thermal nonlinear model, electromagnetic model, components' layouts and statistic data. The main features of the selected technology are summarized in Table II [6]: the high cut-off frequency of this process makes it suitable for application in Ka-band [9], [10].…”
Section: Technologymentioning
confidence: 99%