2006
DOI: 10.1590/s0103-97332006000600050
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Adherent diamond-like carbon coatings on metals via PECVD and IBAD

Abstract: Adherent and low-stress a-C:H films were deposited on Ti6Al4V and stainless steel substrates using PECVD and IBAD techniques. An amorphous silicon interlayer was applied to improve the adhesion of the a-C:H films on the metal substrates. The XPS technique was employed to analyze the chemical bondings within the interfaces. The elemental composition and atomic density of the films were determined by ion beam analysis. The film microstructure was studied by means of Raman scattering spectroscopy. The mechanical … Show more

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Cited by 10 publications
(6 citation statements)
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“…In many applications, a low substrate temperature is necessary, as is the capacity to generate unique materials. Plasma processing happens at temperatures close to ambient, which helps prevent heatrelated process yield loss [69]. Thermal stress and degradation in polymer devices are minimized by the room-temperature plasma process [70].…”
Section: Organic Coatingsmentioning
confidence: 99%
See 1 more Smart Citation
“…In many applications, a low substrate temperature is necessary, as is the capacity to generate unique materials. Plasma processing happens at temperatures close to ambient, which helps prevent heatrelated process yield loss [69]. Thermal stress and degradation in polymer devices are minimized by the room-temperature plasma process [70].…”
Section: Organic Coatingsmentioning
confidence: 99%
“…Furthermore, direct application to the exterior or inside of complex-shaped items is possible [67]. Depending on the type and size of the device, this can be applied to multiple items at once [69,70]. So that varied substrate shapes, such as flat, hemispherical, cylindrical, inside tubes, etc., can be consistently coated [64].…”
Section: Organic Coatingsmentioning
confidence: 99%
“…Our group and collaborators have, for many years, investigated the parameters of the DLC deposition process, using acetylene or hexane with several metallic surfaces modified with a silicon interface. These studies provided the best conditions for the PECVD system, considering the effects of precursors, pressure, voltage, and current in terms of controlling the hydrogen content in DLC films [20,22,23]. The present work considers the effects of these parameters in terms of managing the film thickness.…”
Section: Dlc Deposition Proceduresmentioning
confidence: 99%
“…However, the adherence of these films can be a problem, since delamination had been described (11). As an technical resolution to adherence problem, an intermediate layer of silicon has been used between the different types of substrates and the DLC films to increase the adhesion of these coatings (12). This paper evaluates the in vivo effect of DLC and DLC-Ag film deposition by plasma-enhanced chemical vapor deposition (PECVD) on titanium alloy samples to pursue its future use as a coating material for prosthetic joints.…”
Section: Introductionmentioning
confidence: 99%