2002
DOI: 10.1590/s0103-50532002000500027
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Characterization of Spin-Coated Polymer Films

Abstract: Neste trabalho a morfologia de filmes obtidos por revestimento rotacional foi explicada como sendo resultante de forças competitivas entre polímero, solvente e substrato. Lâminas de silício (superfícies polares) suportaram os filmes. Tolueno e tetrahidrofurano (THF) foram os solventes escolhidos para dissolver poliestireno (PS), poli(cloreto de vinila) (PVC) e poli(butiral vinílico) (PVB). Análises de microscopia de força atômica mostraram que filmes de PS obtidos a partir de soluções preparadas em tolueno são… Show more

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Cited by 51 publications
(52 citation statements)
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References 15 publications
(18 reference statements)
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“…The film thickness is mainly controlled by the concentration of the polymer in solution, while polymer molecular weight (Schubert 1997), spinning velocity (Hall et al 1998), spinning time (Gu et al 1996) and solvent evaporation rate (Meyerhofer 1978;Walsh and Franses 2003;Strawhecker et al 2001) are less important. On the other hand, morphology and roughness of thin polymer films depend on the solvent chosen for polymer solution preparation (Walsh and Franses 2003;Strawhecker et al 2001;Müller-Buschbaum et al 2001;Cui et al 2006;Lin et al 2004;Petri 2002), solution concentration (Schubert and Dunkel 2003) and spinning velocity. The solvent must be a good solvent for the polymer, but one should be aware that it competes for the substrate (Silberberg 1968).…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The film thickness is mainly controlled by the concentration of the polymer in solution, while polymer molecular weight (Schubert 1997), spinning velocity (Hall et al 1998), spinning time (Gu et al 1996) and solvent evaporation rate (Meyerhofer 1978;Walsh and Franses 2003;Strawhecker et al 2001) are less important. On the other hand, morphology and roughness of thin polymer films depend on the solvent chosen for polymer solution preparation (Walsh and Franses 2003;Strawhecker et al 2001;Müller-Buschbaum et al 2001;Cui et al 2006;Lin et al 2004;Petri 2002), solution concentration (Schubert and Dunkel 2003) and spinning velocity. The solvent must be a good solvent for the polymer, but one should be aware that it competes for the substrate (Silberberg 1968).…”
Section: Introductionmentioning
confidence: 99%
“…The solvent must be a good solvent for the polymer, but one should be aware that it competes for the substrate (Silberberg 1968). The balance between substrate-polymer interaction and substrate-solvent interaction plays a very important role on the resulting surface morphology of spincoated films (Cheung et al 2005;Lin et al 2004;Petri 2002;Silberberg 1968). …”
Section: Introductionmentioning
confidence: 99%
“…Immobilization of TXG and HXG onto Si/SiO 2 wafers 22 Under equilibrium conditions XGs did not adsorb from solution onto Si/SiO 2 surfaces, indicating that negatively charged SiO -groups on the surface do not attract XG chains. Interestingly, TXG and HXG formed films by casting onto Si/SiO 2 surfaces with mean thickness of (2.4 ± 0.4) nm and (3.8 ± 0.9) nm, respectively.…”
Section: Resultsmentioning
confidence: 99%
“…2b. It has been known that many parameters such as the solvent quality, solution viscosity and solvent vapor post-treatment control the resulting structure on spin-coated polymer films [4][5][6][7][8]. Lower the solvent's BP is, faster the volatile organic solvent evaporates during the spin-coating process.…”
Section: Resultsmentioning
confidence: 99%