Films Deposited from Reactive Sputtering of Aluminum Acetylacetonate Under Low Energy Ion Bombardment

Abstract

Films were deposited from aluminum acetylacetonate (Al(acac) 3 ) using a methodology involving reactive sputtering and low energy ion bombardment. The plasma was generated by the application of radiofrequency power to the powder containing electrode and simultaneously, negative pulses were supplied to the electrode where the substrates were attached. It was investigated the effect of the duty cycle of the pulses (Δ) on the properties of the coatings. Association of ion bombardment to the deposition process increased film thickness, structure reticulation and organic content. Ions from the deposition environment were implanted at the film-air interface or underneath it. Morphology and topography were altered depending on Δ. Considering the enhancement of Δ, it affected the flux of ions reaching the depositing interface and then the deposition rate, H content, crosslinking degree and surface microstructure. Alumina groups were detected in the infrared spectra, whereas the precipitation of amorphous alumina was confirmed by X-ray diffraction.

Gas-phase aluminium acetylacetonate decomposition: revision of the current mechanism by VUV synchrotron radiation

“…Metal -diketonates are advantageous, due to their relatively high vapour pressure at moderate temperatures and their thermal stability, 10 which explains the increased use of the nontoxic and inexpensive aluminium tris(acetylacetonate) Al(C5H7O2)3 as a precursor in MOCVD. [11][12][13][14][15][16][17][18][19] It is well-known that gas-phase reactions play an important role in the determination of the film composition, purity, and growth rate. 9 Due to the high activation energy of the unimolecular dissociation of metal -diketonates, the homogeneous decomposition of the gaseous precursor is considered as the rate-limiting step for film growth.…”

Improved Electrochemical Performance for High-Voltage Spinel LiNi0.5Mn1.5O4 Modified by Supercritical Fluid Chemical Deposition

“…The spectrum of each coated material contains all of the peaks characteristic of the bare LNMO material, showing a disordered structure described in the Fd -3 m space group, whereas additional peaks observed above 800 cm –1 are similar to those typical of the coating prepared in supercritical conditions as reference. The bands observed at 1030 and 860 cm –1 and attributed, respectively, to vibrations of AlO and Al–O are characteristic of an Al 2 O 3 -type phase . Nevertheless, signals corresponding to vibrations of O–H, C–H, and CC groups are also detected at 3550, 2968, and 2930 and around 1600–1500 cm –1 , respectively (Figure S8).…”

“…The bands observed at 1030 and 860 cm −1 and attributed, respectively, to vibrations of Al�O and Al−O are characteristic of an Al 2 O 3type phase. 50 Nevertheless, signals corresponding to vibrations of O−H, C−H, and C�C groups are also detected at 3550, 2968, and 2930 and around 1600−1500 cm −1 , respectively (Figure S8). These results suggest that an aluminum-rich (oxyhydr)oxide amorphous coating is formed with residues of carbon coming from the transformation of Al(acac) 3 .…”