Integrated photonic interconnect technology presents a disruptive alternative to electrical I/O for many VLSI applications. Superior bandwidth-density and energy-efficient operation can be realized through dense wavelength-division multiplexing (DWDM) and lower transmission losses. There are two main paths towards an integrated platform. Hybrid/heterogeneous designs [1][2][3] enable each component to be custom-tailored, but suffer from large packaging parasitics, increased manufacturing costs due to requisite process flows, and costly 3D integration or microbump packaging. Monolithic integration mitigates integration overheads, but has not penetrated deeply-scaled technologies due to necessary process customizations [4]. The first monolithic integration of photonic devices and electronic-photonic operation in sub-100 nm (45 nm SOI process with zero foundry changes) is demonstrated in [5]. This paper presents a monolithically integrated optical modulator with a new all-digital driver circuit in a commercial 45nm SOI process. The waveform-conditioning driver circuit enables the carrier-injection modulator to operate at 2.5Gb/s with an energy-cost of 1.23pJ/b, making it ~4× faster and more energy-efficient than the previous monolithically integrated driver/modulator presented in [5].The double-data-rate (DDR) modulator and driver circuit (Fig. 7.6.1) are fabricated as part of a 5M-transistor integrated platform for optical I/O. Light from an off-chip laser couples onto the die through vertical grating couplers and propagates through on-chip silicon waveguides. Fed by two 31b on-chip pseudo-random bit sequence (PRBS) generators, the DDR modulator circuit drives the modulator device to imprint data onto a particular wavelength-channel. A digital snapshot checks the validity of the generated data. The optically-modulated data is brought off-chip through a vertical grating coupler and measured using an optical oscilloscope.The optical modulator device is a resonant ring with rib waveguide carrier-injection phase shifters, identical to the one in [5], implemented using a combination of the gate polysilicon and body silicon layers in the process front-end. The device cross-section and transfer function are illustrated in Fig. 7.6.2. The optical 3dB bandwidth of the device is 45GHz. Modulation is achieved by tuning the ring in and out of the wavelength-channel through carrier injection. Due to long carrier lifetimes in single-crystalline Si, this device has an electrical 3dB bandwidth of approximately 250MHz that limits the data-rate in [5] to 600Mb/s at an energy cost of 4.2pJ/b. The driver we present in this work overcomes this bandwidth limitation through optimized drive conditioning with the same optical device design and 1950μm 2 area footprint.The DDR driver circuit (Fig. 7.6.3) is designed as an all-digital push-pull driver circuit with configurable drive strengths, sub-bit-time pre-emphasis [6] and split supplies, operating over a range of drive current profiles required for a wide variety of optical devices. The ...