2011 IEEE 23rd International Symposium on Power Semiconductor Devices and ICs 2011
DOI: 10.1109/ispsd.2011.5890787
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1.7kV trench IGBT with deep and separate floating p-layer designed for low loss, low EMI noise, and high reliability

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Cited by 22 publications
(18 citation statements)
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“…To achieve this, one should consider the following design rules: 1) Carrier enhancement at the emitter for low on-state losses. The IGBT can be designed to have a dense plasma near the emitter by adopting Trench cell designs [18], implementing n-enhancement layers [19] or by reducing the mesa width between trenches [20]. Modern IGBTs, which are designed in accordance with one of these approaches, have to provide a sufficient hole injection from the collector side.…”
Section: Discussionmentioning
confidence: 99%
“…To achieve this, one should consider the following design rules: 1) Carrier enhancement at the emitter for low on-state losses. The IGBT can be designed to have a dense plasma near the emitter by adopting Trench cell designs [18], implementing n-enhancement layers [19] or by reducing the mesa width between trenches [20]. Modern IGBTs, which are designed in accordance with one of these approaches, have to provide a sufficient hole injection from the collector side.…”
Section: Discussionmentioning
confidence: 99%
“…Hence the improvement of the trade-off generally requires complexities from the structural and wafer process points of view [40][41][42][43][44][45][46][47][48]. In the turn-off period, it is also inevitable to face almost same situations in order to obtain waveforms with lower di/dt or less surge voltage [40,44,45,48]. In addition, a rational balance of C gc versus C ge or C ec is an important parameter to achieve soft waveforms without any partial rapid portions or inflection points.…”
Section: Improving Usabilitymentioning
confidence: 99%
“…where C GC(OX) is the gate oxide component of C GC and V GE is the gate-to-emitter voltage [1][2][3][4][5][6][7][8]. Clearly, C GC(OX) has the same value in the proposed TIGBT and the conventional one.…”
mentioning
confidence: 99%
“…However, too small C GC would cause a high dV/dt noise especially when the free-wheeling diode (FWD) operates at a small current [5]. Suppressing the increase of the potential of the floating P-base region (V Float ) has been proven to be very effective, but some other electrical characteristics, such as the on-state voltage or the breakdown voltage, would be affected [5][6][7][8]. Some efforts have been made to increase the gate-to-emitter capacitance (C GE ) to optimise the ratio of C GC to C GE , but it also increases C GC [9].…”
mentioning
confidence: 99%