Double-Ronchi shearing interferometry is widely used in wavefront
aberration measurements for advanced lithography projection lens
systems. A rigorous simulation model of double-Ronchi shearing
interferometry on lithographic tools is the precondition for
phase-shifting retrieval algorithm design and error analysis. This
paper presents a rigorous simulation model of double-Ronchi shearing
interferometry considering the vector nature of light. The model is
accurate and can be used in the study of double-Ronchi shearing
interferometry.
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