2023
DOI: 10.1364/ao.489083
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Rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools

Abstract: Double-Ronchi shearing interferometry is widely used in wavefront aberration measurements for advanced lithography projection lens systems. A rigorous simulation model of double-Ronchi shearing interferometry on lithographic tools is the precondition for phase-shifting retrieval algorithm design and error analysis. This paper presents a rigorous simulation model of double-Ronchi shearing interferometry considering the vector nature of light. The model is accurate and can be u… Show more

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