n - Zn O ∕ Si O x ∕ n - Si and n-ZnO∕SiOx∕p-Si heterostructured light-emitting diodes have been fabricated using metal-organic chemical-vapor deposition for a comparison study. n-ZnO∕SiOx∕p-Si heterostructures show diodelike rectifying current-voltage characteristic with low breakdown voltage, while n-ZnO∕SiOx∕n-Si heterostructures show symmetric nonlinear current-voltage behavior due to the double Schottky barriers at the interface. Both types of diodes emit light when a positive bias applied at Si side. Ultraviolet emission at ∼390nm with an orange-emission centered at ∼600nm were observed in electroluminescence spectra of n-ZnO∕SiOx∕n-Si diodes, while whitish emission centered at ∼520nm was observed for n-ZnO∕SiOx∕p-Si diodes. The emission mechanisms were discussed.
Strong visible electroluminescence (EL) has been observed from a 30 nm silicon nitride thin film multiply implanted with Si ions and annealed at 1100 °C. The EL intensity shows a linear relationship with the current transport in the thin film at lower voltages, but a departure from the linear relationship with a quenching in the EL intensity is observed at higher voltages. The EL spectra show two primary EL bands including the predominant violet band at ∼3.0 eV (415 nm) and the strong green-yellow band at ∼2.2 eV (560 nm). Two weak bands including the ultraviolet band at ∼3.8 eV and the near infrared band at ∼1.45 eV emerge at high voltages. The evolution of each EL band with the voltage has been examined. The phenomena observed are explained, and the EL mechanisms are discussed.
A new model for optimization of organic light-emitting device by concurrent incorporation of electrical and optical simulations J. Appl. Phys. 112, 084507 (2012) Hybrid white organic light-emitting diodes with a double light-emitting layer structure for high color-rendering index J. Appl. Phys. 112, 084504 (2012) Improvement of optical performance of ZnO/GaN p-n junctions with an InGaN interlayer Appl. Phys. Lett. 101, 161905 (2012) Efficiency droop due to electron spill-over and limited hole injection in III-nitride visible light-emitting diodes employing lattice-matched InAlN electron blocking layers Appl. Phys. Lett. 101, 161110 (2012) Dependence of radiative efficiency and deep level defect incorporation on threading dislocation density for InGaN/GaN light emitting diodes
Visible electroluminescence (EL) with two composite bands, i.e., a violet band and a green-yellow band has been observed from Si-implanted silicon nitride thin films. By varying the intensity ratio of the two composite EL bands in terms of the injection current, strong white-color EL can be achieved at certain injection currents (e.g., ~265 mA/cm(2)). The observed transition in EL color from violet to white under different injection conditions is studied based on the understanding that the violet band is originated from silicon nitride matrix while the green-yellow band is related to the implanted Si. The Si-implanted silicon nitride thin film offers the possibility of electrically tunable white-light Si-based light emitters.
Influence of thermal annealing on electroluminescence ͑EL͒ from multiple-Si-implanted silicon nitride films has been investigated. A reduced injection current and an enhanced EL intensity have been obtained simultaneously by increasing the annealing temperature, which results in a higher EL quantum efficiency. In addition, four emission bands are identified, and their peak energies, intensities, and full widths at half maxima are found to change with annealing temperature. A model is proposed to illustrate the carrier transport, the mechanisms of the four emission bands, and the evolution of the EL bands with annealing as well. The two major bands and the minor ultraviolet band are explained in terms of the recombination of the injected electrons in either the silicon dangling-bond ͑ϵSi 0 ͒ states or the nitride conduction band with the injected holes in either the band tail states above the nitride valence band or the valence band itself, while the minor near infrared band is attributed to the Si nanocrystals formed in the thin film.
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