Rustproof, chemical-resistant pure-iron thin films were successfully fabricated by the 157 nm F2-laser-induced surface modification of 50-nm-thick iron thin films. An approximately 2-nm-thick Fe3O4 layer underneath a native Fe2O3 layer of approximately 0.6 nm in thickness was formed on the iron thin films after F2 laser irradiation, as confirmed by X-ray photoelectron spectroscopy. The anodic polarization measurement in a 3 wt % NaCl aqueous solution (quasi-seawater) was conducted; the F2-laser-irradiated samples showed high corrosion resistance to the quasi-seawater. Moreover, no rust was observed on the samples after the immersion test in quasi-seawater for 48 h and longer. The measurement also revealed that the F2-laser-irradiated samples showed high corrosion resistance to a HNO3 aqueous solution. Thus, the micropatterning of iron thin films was demonstrated by the combination of F2 laser irradiation and subsequent HNO3 chemical etching.

Nanoswellings of 60 nm height and 500 nm diameter on average of an iron thin film deposited on a silica glass substrate at regular intervals of 2.5 µm were fabricated by the irradiation of a 157 nm F2 laser. The F2 laser was focused on the iron thin film by each microsphere made of silica glass of 2.5 µm diameter, which covered the entire surface of the films. The surface of the silica glass substrate underneath the F2-laser-irradiated iron thin film selectively swelled to push up the film. After the laser-induced micro/nanostructuring, the F2 laser was again irradiated onto the entire surface of the periodic micro/nanostructured iron thin film to form an approximately 2-nm-thick Fe3O4 modified layer. As a result, the samples showed hydrophobicity and high corrosion resistance to 3 wt % NaCl aqueous solution (quasi-seawater). No rust was observed on the samples after the immersion test in the quasi-seawater for 24 h.

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Fig.2 Micro-pattern of the laser irradiated Fe thin films after NHO 3 chemical etching 200 μm Fe 3 O 4 /Fe thin films slide Abstract A vacuum-UV F 2 laser of 157 nm wavelength induced strong oxidation of Fe thin film surface to show the chemical resistance to pseudo seawater and HNO 3 aqueous solution for selective metallization on silica glass substrate. The strong oxidation reactions on the surface and in the depth direction were confirmed by X-ray photoelectron spectroscopy. The corrosion resistance of the F 2 laser irradiated samples was also supported by an electrochemical test. A fine pattern of the F 2 laser irradiated Fe thin film was successfully formed after the HNO 3 chemical etching.