Phosphorene, an elemental 2D material, which is the monolayer of black phosphorus, has been mechanically exfoliated recently. In its bulk form, black phosphorus shows high carrier mobility (~10000 cm 2 /V· s) and a ~0.3 eV direct bandgap. Well-behaved p-type field-effect transistors with mobilities of up to 1000 cm 2 /V· s, as well as phototransistors, have been demonstrated on few-layer black phosphorus, showing its promise for electronics and optoelectronics applications due to its high hole mobility and thickness-dependence direct bandgap. However, p-n junctions, the basic building blocks of modern electronic and optoelectronic devices, have not yet been realized based on black phosphorus. In this paper, we demonstrate a gate tunable p-n diode based on a p-type black phosphorus/n-type monolayer MoS2 van der Waals p-n heterojunction. Upon illumination, these ultra-thin p-n diodes show a maximum photodetection responsivity of 418 mA/W at the wavelength of 633 nm, and photovoltaic energy conversion with an external quantum efficiency of 0.3%. These p-n diodes show promise for broadband photodetection and solar energy harvesting.Key words: black phosphorus, phosphorene, MoS2, p-n diode, van der Waals heterojunction, photodetection, solar cell 3 The successful isolation of graphene from graphite has led to its extensive study in physics, materials, and nano-engineering due to its extraordinary electrical and mechanical properties. [1][2][3][4] However, a lack of a bandgap limits its potential for electronic device applications, and has inspired the exploration of other 2D layered materials. [5][6][7] Among them, transition metal dichalcogenides (TMDCs), such as MoS2, are the most studied materials. [8][9][10][11] Recently, phosphorene, the monolayer form of black phosphorus, has been successfully isolated. 12 Analogous to graphite and graphene, black phosphorus is a stack of phosphorene monolayers, bound together by van der Waals interactions. 12,13 Bulk black phosphorus shows a ~0.3 eV direct bandgap and a mobility of up to ~10000 cm 2 /V· s. 14-17 Its bandgap increases as its thickness decreases, and is predicted to have a >1 eV direct bandgap in its monolayer form. 12,13 Well-behaved p-type field-effect transistors with mobilities of up to 1000 cm 2 /V· s, as well as inverters, have been demonstrated on few-layer black phosphorus. 12,13,[18][19][20] Based on its direct bandgap, few-layer black phosphorus phototransistors have been demonstrated with a responsivity of 4.8 mA/W. 19 These results indicate that black phosphorus is a promising candidate for both high performance electronics and optoelectronics applications due to its ultra-thin 2D nature, high hole mobility, and narrower direct bandgap compared to most of TMDCs. P-N junctions are the basic building blocks of modern semiconductor devices, including diodes, bipolar transistors, photodiodes, light-emitting diodes, and solar cells. In the conventional p-n homo-junction, the p-and n-type regions are formed by 4 chemically doping a bulk semiconduct...

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Black phosphorus has been revisited recently as a new two-dimensional material showing potential applications in electronics and optoelectronics. Here we report the anisotropic in-plane thermal conductivity of suspended few-layer black phosphorus measured by micro-Raman spectroscopy. The armchair and zigzag thermal conductivities are ∼20 and ∼40 W m−1 K−1 for black phosphorus films thicker than 15 nm, respectively, and decrease to ∼10 and ∼20 W m−1 K−1 as the film thickness is reduced, exhibiting significant anisotropy. The thermal conductivity anisotropic ratio is found to be ∼2 for thick black phosphorus films and drops to ∼1.5 for the thinnest 9.5-nm-thick film. Theoretical modelling reveals that the observed anisotropy is primarily related to the anisotropic phonon dispersion, whereas the intrinsic phonon scattering rates are found to be similar along the armchair and zigzag directions. Surface scattering in the black phosphorus films is shown to strongly suppress the contribution of long mean-free-path acoustic phonons.

Although monolayer black phosphorus (BP), or phosphorene, has been successfully exfoliated and its optical properties have been explored, most of the electrical performance of the devices is demonstrated on few-layer phosphorene and ultrathin BP films. In this paper, we study the channel length scaling of ultrathin BP field-effect transistors (FETs) and discuss a scheme for using various contact metals to change the transistor characteristics. Through studying transistor behaviors with various channel lengths, the contact resistance can be extracted with the transfer length method (TLM). With different contact metals, we find out that the metal/BP interface has different Schottky barrier heights, leading to a significant difference in contact resistance, which is quite different from previous studies of transition metal dichalcogenides (TMDs), such as MoS2, where the Fermi level is strongly pinned near the conduction band edge at the metal/MoS2 interface. The nature of BP transistors is Schottky barrier FETs, where the on and off states are controlled by tuning the Schottky barriers at the two contacts. We also observe the ambipolar characteristics of BP transistors with enhanced n-type drain current and demonstrate that the p-type carriers can be easily shifted to n-type or vice versa by controlling the gate bias and drain bias, showing the potential to realize BP CMOS logic circuits.

In this article, we study the properties of metal contacts to single-layer molybdenum disulfide (MoS2) crystals, revealing the nature of switching mechanism in MoS2 transistors. On investigating transistor behavior as contact length changes, we find that the contact resistivity for metal/MoS2 junctions is defined by contact area instead of contact width. The minimum gate dependent transfer length is ~0.63 μm in the on-state for metal (Ti) contacted single-layer MoS2. These results reveal that MoS2 transistors are Schottky barrier transistors, where the on/off states are switched by the tuning the Schottky barriers at contacts. The effective barrier heights for source and drain barriers are primarily controlled by gate and drain biases, respectively. We discuss the drain induced barrier narrowing effect for short channel devices, which may reduce the influence of large contact resistance for MoS2 Schottky barrier transistors at the channel length scaling limit.

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