In semiconductor device manufacturing, single wafer processors are widely used in not only BEOL process but also in FEOL process for 2X devices to improve the cleaning efficiency and get the higher productivity. Because the scaled down devices require the minimum substrate loss in the cleaning steps, the physical force by a dual fluid spray is still the main position to improve the cleaning efficiency at the moment comparing with chemical effects as the dissolution of contaminants and/or the lift off of particles. Sato, et al., reported that the relationship between particle removal and droplet characteristics linked to the droplet energy densityEdas following equation [. The kinetic energyEkof droplet is calculated from droplet diameterdand velocityv, as shown in Equation 1.
The novel polymer poly(5-methylenebenzotriazol-N-yl), denoted BTA-poly, was investigated for the protection of copper by electrochemical studies and weight loss measurements. The electrochemical measurements were compared to weight loss measurements and satisfactory results were obtained.Compared with benzotriazole, which is one of the best corrosion inhibitors for copper, BTA-poly achieves good protection under the same test conditions. Due to the rapid adsorption of BTA-poly onto copper, its corrosion-inhibition efficiency can be controlled by varying the concentration. The protecting effects of the polymers were studied in a sodium chloride solution using electrochemical measurements and an immersion test. The surface characteristics of the polymer-modified copper were analyzed via X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM). These results show that BTA-poly can be easily adsorbed onto the copper surface via self-assembly to achieve excellent anticorrosion/antioxidation effects.
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