New isolation scheme for CMOS image sensor pixel is proposed and its improved dark current performance is reported. It is well known that shallow trench isolation (STI) is one of major sources of dark current in imager pixel due to the existence of interfacial defects at STI/Si interface. On the account STI-free structure over the whole pixel area was previously reported for reducing dark current. As the size of pixel pitch is shrunk, however, it becomes increasingly difficult to isolate in-pixel transistors electrically without STI. In this work, we implemented hybrid type isolation scheme of removing STI around photodiode to suppress the dark current and remaining STI near transistors to guarantee the electrical isolation of transistors in pixel. It was successfully achieved that the dark current was significantly reduced by removing the STI around the photodiode together with normal operation of in-pixel transistors.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.