Studying the ohmic contacts formed on ion-implanted SiC layers is fundamental to understand and to predict the behavior of practical devices. Ohmic contacts to n- (1×1019cm−3) and p-type (1×1020cm−3) ion-implanted 4H-SiC using Ni/W/TaSi2/Pt were investigated. No degradation of the specific contact resistance nor a minute change of the surface morphologies was observed after 300 h of 500 oC thermal treatment in air. From auger electron spectroscopy (AES) depth profiles, it was found that the oxidation of the protective platinum silicide overlayer significantly slowed down further migration of oxygen to the SiC interface. In addition, Pt and W played the role of mutual blocking, which guarantees the stability of the contact. This research suggests that the contacts are very promising for applications in harsh environments, where the simultaneously completed both on n-and p-type stability ohmic contacts is crucial.
Abstract-A nano-power CMOS voltage reference is proposed in this paper. Through a combination of switched-capacitor technology with the body effect in MOSFETs, the output voltage is defined as the difference between two gate-source voltages using only a single PMOS transistor operated in the subthreshold region, which has low sensitivity to the temperature and supply voltage. A low output, which breaks the threshold restriction, is produced without any subdivision of the components, and flexible trimming capability can be achieved with a composite transistor, such that the chip area is saved. The chip is implemented in 0.18 µm standard CMOS technology. Measurements show that the output voltage is approximately 123.3 mV, the temperature coefficient is 17.6 ppm/ o C, and the line sensitivity is 0.15 %/V. When the supply voltage is 1 V, the supply current is less than 90 nA at room temperature. The area occupation is approximately 0.03 mm 2 .
This paper proposes a new N-type 4H-SiC extraction-enhanced vertical insulated-gate bipolar transistor (E2VIGBT), which uses a partial Schottky contact to the collector region bottom surface as a carrier extractor to enhance the carrier extraction, so that the switching performance will be improved. TCAD simulation shows that, at an operation frequency of 250 kHz, the E2VIGBT offers a turn-off loss decrease of 69.2% and a total energy loss in a single period reduction of 34.4% when compared with conventional field-stop 4H-SiC IGBTs. With further specific optimization, the proposed structure consumes less energy in a much wider frequency range. The simulation results indicate that this new type of IGBT performs better in high frequency applications.
In this paper, a 5.7kV 4H-SiC Junction Barrier Schottky diode(JBS) with non-uniform field limiting rings termination is simulated and fabricated successfully based on a epitaxial thickness of 49μm and the doping concentration about 1.04×1015cm-3 respectively. The reverse breakdown voltage could reach to 5.7kV at least at reverse current of 200μA. And the on-state voltage is 3V at the forward current of 2A, corresponding to an on-resistance of 32mΩ•cm2. The corresponding figure-of- merit of VB2/ RSP-ON for our fabricated device is 1.026 GW/cm2, which is closing to the optimal levels among several reported SiC JBS.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.